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US 12,573,580 B2Granted
System and apparatus for stabilizing electron sources in charged particle systems
AssigneeASML Netherlands B.V.
InventorsBruno La Fontaine, Juying Dou, Zhidong Du, Che-Chia Kuo
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Abstract
Apparatuses and systems for stabilizing electron sources in charged particle beam inspection systems are provided. In some embodiments, a system may include an electron source comprising an emitting tip electrically connected to two electrodes and configured to emit an electron; and a base coupled to the emitting tip, wherein the base is configured to stabilize the emitting tip via the coupling.
Claims18
An electron beam system comprising:
- an electron source comprising:
- an emitting tip electrically connected to two electrodes via filament prongs and configured to emit an electron;
- and
- a base comprising a holder configured to support a plurality of tabs, the plurality of tabs configured to contact to the emitting tip, wherein the plurality of tabs are configured to stabilize the emitting tip via the contact.
1 more element
An electron source comprising:
- an emitting tip electrically connected to two electrodes via filament prongs and configured to emit an electron;
- and
- a base comprising a holder configured to support a plurality of tabs, the plurality of tabs configured to contact the emitting tip, wherein the plurality of tabs are configured to stabilize the emitting tip via the contact.
Dependencies are inferred from the claim text.