Remote surface wave propagation for semiconductor chambers

An apparatus that provides plasma to a chamber, comprising:

• a plurality of plasma sources, each with a conductive tube and a gas inlet, wherein the respective conductive tube surrounds a portion of a dielectric tube and the respective conductive tube configured to be directly connected to RF power to generate surface waves in walls of the dielectric tube which form plasma within the dielectric tube, and wherein the gas inlet is connected to the dielectric tube near one end of the conductive tube;
• and
• the dielectric tube directly connected through each of the plurality of plasma sources and is configured to act as a vacuum boundary between plasma generated within the dielectric tube and a processing volume of the chamber to contain plasma generated by the plurality of plasma sources and is configured to release radicals generated in the plasma via holes or nozzles in the dielectric tube and wherein the holes or nozzles in the dielectric tube are positioned in a portion of the dielectric tube which is configured to be inserted into the chamber.