H01J 2237/06308
Thermionic sources
H01J2237/06308 (Thermionic sources) appears on 199 US grants and 194 published applications in this corpus.
Search patents in H01J- Granted patents
- 199
- Published applications
- 194
- Assignees
- 95
- Inventors
- 377
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 4 |
| 2003 | 4 | 3 |
| 2004 | 4 | 5 |
| 2005 | 4 | 8 |
| 2006 | 8 | 5 |
| 2007 | 5 | 11 |
| 2008 | 4 | 8 |
| 2009 | 2 | 9 |
| 2010 | 4 | 11 |
| 2011 | 9 | 7 |
| 2012 | 8 | 7 |
| 2013 | 9 | 7 |
| 2014 | 8 | 8 |
| 2015 | 7 | 8 |
| 2016 | 9 | 3 |
| 2017 | 9 | 10 |
| 2018 | 7 | 4 |
| 2019 | 6 | 7 |
| 2020 | 9 | 8 |
| 2021 | 3 | 7 |
| 2022 | 10 | 16 |
| 2023 | 12 | 18 |
| 2024 | 16 | 12 |
| 2025 | 12 | 7 |
| 2026 | 4 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle gun and charged particle beam apparatus29 Sep 2026US 12,749,643 B2Hitachi High-Tech Corporation
- Electron source and method for manufacturing same, and emitter and device provided with same19 May 2026US 12,633,487 B2Denka Company Limited
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Charged particle beam source13 Jan 2026US 12,525,420 B2FEI Company
- Electron source, electron beam device, and method for manufacturing electron source9 Dec 2025US 12,494,338 B2Hitachi High-Tech Corporation
- Electron beam adjustment method, electron beam apparatus, and storage medium25 Dec 2025US 2025/0391635 A1NuFlare Technology, Inc.
- Charged Particle Source, Charged Particle Gun, and Charged Particle Beam Device18 Dec 2025US 2025/0385065 A1Hitachi High-Tech Corporation
- Junction between hexaboride-containing and tantalum-containing components20 Nov 2025US 2025/0357069 A1FEI Company
- Field emission electron source, method of producing same, and electron beam device using same9 Oct 2025US 2025/0316438 A1Hitachi High-Tech Corporation
- Electron gun and electron beam writing apparatus28 Aug 2025US 2025/0273423 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Electron beam exposure system79US 6,897,458 B2Mapper Lithography IP B.V. · 2005
- Charged particle emission source structure45US 4,721,878 ADenki Kagaku Kogyo Kabushiki Kaisha · 1988
- Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens45US 5,371,371 AKabushiki Kaisha Toshiba · 1994
- Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source43US 6,087,667 ANikon Corporation · 2000
- Electron beam exposure system43US 7,091,504 B2Mapper Lithography IP B.V. · 2006