H01J 2237/06316
Schottky emission
H01J2237/06316 (Schottky emission) appears on 118 US grants and 116 published applications in this corpus.
Search patents in H01J- Granted patents
- 118
- Published applications
- 116
- Assignees
- 56
- Inventors
- 239
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 4 |
| 2003 | 3 | 2 |
| 2004 | 4 | 4 |
| 2005 | 2 | 3 |
| 2006 | 5 | 5 |
| 2007 | 3 | 9 |
| 2008 | 4 | 8 |
| 2009 | 2 | 6 |
| 2010 | 3 | 8 |
| 2011 | 8 | 7 |
| 2012 | 4 | 6 |
| 2013 | 7 | 6 |
| 2014 | 6 | 3 |
| 2015 | 3 | 4 |
| 2016 | 5 | 1 |
| 2017 | 4 | 0 |
| 2018 | 3 | 1 |
| 2019 | 2 | 5 |
| 2020 | 3 | 3 |
| 2021 | 2 | 4 |
| 2022 | 5 | 10 |
| 2023 | 7 | 8 |
| 2024 | 6 | 4 |
| 2025 | 5 | 4 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle gun and charged particle beam apparatus29 Sep 2026US 12,749,643 B2Hitachi High-Tech Corporation
- Charged particle beam source13 Jan 2026US 12,525,420 B2FEI Company
- Electron source, electron beam device, and method for manufacturing electron source9 Dec 2025US 12,494,338 B2Hitachi High-Tech Corporation
- Electron source, method of manufacturing the same, and electron beam apparatus using the same26 Aug 2025US 12,400,823 B2Hitachi High-Tech Corporation
- Electron source, electron gun, and charged particle beam device19 Aug 2025US 12,394,585 B2Hitachi High-Tech Corporation
- Charged Particle Source, Charged Particle Gun, and Charged Particle Beam Device18 Dec 2025US 2025/0385065 A1Hitachi High-Tech Corporation
- Junction between hexaboride-containing and tantalum-containing components20 Nov 2025US 2025/0357069 A1FEI Company
- Field emission electron source, method of producing same, and electron beam device using same9 Oct 2025US 2025/0316438 A1Hitachi High-Tech Corporation
- Electron beam device including schottky emitter and method of operating schottky emitter16 Jan 2025US 2025/0022676 A1Hitachi High-Tech Corporation
- Electron source, manufacturing method therefor, and device comprising electron source17 Oct 2024US 2024/0347306 A1Denka Company Limited
Most cited
By later US patents
- Charged particle emission source structure45US 4,721,878 ADenki Kagaku Kogyo Kabushiki Kaisha · 1988
- Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens45US 5,371,371 AKabushiki Kaisha Toshiba · 1994
- Inspection system by charged particle beam and method of manufacturing devices using the system41US 7,601,972 B2Ebara Corporation · 2009
- Inspection system by charged particle beam and method of manufacturing devices using the system35US 7,135,676 B2Ebara Corporation · 2006
- Electron source and electron beam-emitting apparatus equipped with same31US 5,834,781 AHitachi, Ltd. · 1998