H01J 2237/244
Detection characterized by the detecting means
H01J2237/244 (Detection characterized by the detecting means) appears on 1,768 US grants and 1,794 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,768
- Published applications
- 1,794
- Assignees
- 438
- Inventors
- 3,123
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 3 | 0 |
| 1978 | 6 | 0 |
| 1979 | 5 | 0 |
| 1980 | 3 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 3 | 0 |
| 1986 | 4 | 0 |
| 1987 | 7 | 0 |
| 1988 | 9 | 0 |
| 1989 | 11 | 0 |
| 1990 | 8 | 0 |
| 1991 | 13 | 0 |
| 1992 | 14 | 0 |
| 1993 | 9 | 0 |
| 1994 | 9 | 0 |
| 1995 | 27 | 0 |
| 1996 | 18 | 0 |
| 1997 | 14 | 0 |
| 1998 | 15 | 0 |
| 1999 | 15 | 0 |
| 2000 | 14 | 0 |
| 2001 | 17 | 8 |
| 2002 | 17 | 24 |
| 2003 | 23 | 21 |
| 2004 | 27 | 34 |
| 2005 | 27 | 21 |
| 2006 | 38 | 68 |
| 2007 | 36 | 36 |
| 2008 | 56 | 66 |
| 2009 | 45 | 61 |
| 2010 | 50 | 47 |
| 2011 | 46 | 53 |
| 2012 | 53 | 66 |
| 2013 | 66 | 58 |
| 2014 | 67 | 69 |
| 2015 | 66 | 99 |
| 2016 | 78 | 78 |
| 2017 | 90 | 83 |
| 2018 | 71 | 60 |
| 2019 | 81 | 116 |
| 2020 | 116 | 129 |
| 2021 | 107 | 105 |
| 2022 | 87 | 107 |
| 2023 | 88 | 111 |
| 2024 | 59 | 89 |
| 2025 | 77 | 110 |
| 2026 | 60 | 75 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 2237/2448Secondary particle detectorsIndexing code469
- H01J 2237/2446Position sensitive detectorsIndexing code391
- H01J 2237/24475Scattered electron detectorsIndexing code298
- H01J 2237/2445Photon detectors for x-rays, lightIndexing code272
- H01J 2237/24495Signal processingIndexing code271
- H01J 2237/2441Semiconductor detectorsIndexing code241
- H01J 2237/24485Energy spectrometersIndexing code222
- H01J 2237/2443Scintillation detectorsIndexing code198
All 13 subgroupsShow fewer
Recent patents
- Electron beam applicator and creation method of detection data in electron beam applicator15 Sep 2026US 12,738,441 B2Photo electron Soul Inc.
- Charged particle beam device and specimen observation method15 Sep 2026US 12,738,442 B2Hitachi High-Tech Corporation
- Laser-based contrast control in transmission electron microscopy15 Sep 2026US 12,738,449 B2Yeda Research and Development Co. Ltd.
- Plasma measuring method and plasma processing apparatus8 Sep 2026US 12,731,772 B2Tokyo Electron Limited
- Charged particle beam device25 Aug 2026US 12,719,010 B2Hitachi High-Tech Corporation
- Method for operating a particle beam apparatus, computer program product and particle beam apparatus for carrying out the method8 Oct 2026US 2026/0311958 A1Carl Zeiss Microscopy GmbH
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- System and Method for Extending Faraday Setup Cup Life Time by Scanning Ion Beam during Setup1 Oct 2026US 2026/0302125 A1APPLIED Materials.Inc.
- Method and apparatus for continuous chained energy ion implantation1 Oct 2026US 2026/0302126 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Wafer pattern defect detection method and apparatus therefor138US 5,576,833 AKabushiki Kaisha Toshiba · 1996
- Method of multivariate spectral analysis138US 6,675,106 B1Sandia Corporation · 2004
- Reliable defect detection using multiple perspective scanning electron microscope images92US 5,659,172 AOpal Technologies Ltd. · 1997
- Scanning electron microscope and method for production of semiconductor device by using the same90US 5,412,210 AHitachi, Ltd. · 1995