H01J 2237/24495
Signal processing
Official title: Signal processing, e.g. mixing of two or more signals
H01J2237/24495 (Signal processing) appears on 271 US grants and 314 published applications in this corpus.
Search patents in H01J- Granted patents
- 271
- Published applications
- 314
- Assignees
- 93
- Inventors
- 716
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 6 | 0 |
| 1996 | 4 | 0 |
| 1997 | 4 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 2 |
| 2003 | 2 | 2 |
| 2004 | 2 | 5 |
| 2005 | 4 | 1 |
| 2006 | 3 | 10 |
| 2007 | 6 | 4 |
| 2008 | 6 | 9 |
| 2009 | 6 | 7 |
| 2010 | 7 | 8 |
| 2011 | 8 | 9 |
| 2012 | 11 | 13 |
| 2013 | 5 | 4 |
| 2014 | 9 | 9 |
| 2015 | 13 | 21 |
| 2016 | 13 | 14 |
| 2017 | 12 | 18 |
| 2018 | 18 | 7 |
| 2019 | 15 | 19 |
| 2020 | 20 | 31 |
| 2021 | 24 | 18 |
| 2022 | 17 | 13 |
| 2023 | 10 | 26 |
| 2024 | 9 | 22 |
| 2025 | 11 | 26 |
| 2026 | 13 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron beam applicator and creation method of detection data in electron beam applicator15 Sep 2026US 12,738,441 B2Photo electron Soul Inc.
- Charged particle beam device and specimen observation method15 Sep 2026US 12,738,442 B2Hitachi High-Tech Corporation
- Plasma measuring method and plasma processing apparatus8 Sep 2026US 12,731,772 B2Tokyo Electron Limited
- Charged particle beam device25 Aug 2026US 12,719,010 B2Hitachi High-Tech Corporation
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Charged particle beam device and control method therefor1 Oct 2026US 2026/0302131 A1Hitachi, Ltd.
- Switch matrix configuration for improved bandwidth performance3 Sep 2026US 2026/0260843 A1ASML Netherlands B. V.
- Scanning electron microscope and photomultiplier therefor and method of evaluating a sample27 Aug 2026US 2026/0253835 A1Applied Materials Israel Ltd.
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Reliable defect detection using multiple perspective scanning electron microscope images92US 5,659,172 AOpal Technologies Ltd. · 1997
- Scanning electron microscope and method for production of semiconductor device by using the same90US 5,412,210 AHitachi, Ltd. · 1995
- Pattern inspection apparatus and electron beam apparatus86US 5,430,292 AFujitsu Limited · 1995
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996