H01J 2237/24405
Faraday cages
H01J2237/24405 (Faraday cages) appears on 130 US grants and 120 published applications in this corpus.
Search patents in H01J- Granted patents
- 130
- Published applications
- 120
- Assignees
- 73
- Inventors
- 314
- Latest grant
- 10 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 4 | 2 |
| 2002 | 3 | 2 |
| 2003 | 5 | 4 |
| 2004 | 4 | 4 |
| 2005 | 2 | 4 |
| 2006 | 5 | 10 |
| 2007 | 4 | 9 |
| 2008 | 12 | 13 |
| 2009 | 5 | 3 |
| 2010 | 7 | 6 |
| 2011 | 5 | 3 |
| 2012 | 3 | 3 |
| 2013 | 2 | 6 |
| 2014 | 8 | 3 |
| 2015 | 2 | 5 |
| 2016 | 5 | 6 |
| 2017 | 6 | 4 |
| 2018 | 2 | 2 |
| 2019 | 4 | 4 |
| 2020 | 6 | 6 |
| 2021 | 3 | 6 |
| 2022 | 2 | 3 |
| 2023 | 5 | 3 |
| 2024 | 4 | 4 |
| 2025 | 2 | 3 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Ion collector for use in plasma systems10 Feb 2026US 12,548,745 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Dose cup assembly for an ion implanter27 Jan 2026US 12,537,161 B2APPLIED Materials.Inc.
- Closed loop faraday correction of a horizontal beam current profile for uniform current tuning22 Apr 2025US 12,283,460 B2APPLIED Materials.Inc.
- Systems and methods for optimizing full horizontal scanned beam distance7 Jan 2025US 12,191,113 B2APPLIED Materials.Inc.
- Beam adjustment method and three-dimensional powder bed fusion additive manufacturing apparatus25 Jun 2024US 12,020,894 B2JEOL Ltd.
- System and Method for Extending Faraday Setup Cup Life Time by Scanning Ion Beam during Setup1 Oct 2026US 2026/0302125 A1APPLIED Materials.Inc.
- Method for substrate processing5 Mar 2026US 2026/0066217 A1Tel Manufacturing and Engineering of America, Inc.
- Detection of Space Charge Effect During Ion Implantation16 Oct 2025US 2025/0323013 A1
- Grid-less ion angle detector18 Sep 2025US 2025/0291076 A1Tokyo Electron Limited
- Grid-less ion energy detector18 Sep 2025US 2025/0292994 A1Tokyo Electron Limited
Most cited
By later US patents
- Dose monitor for plasma doping system65US 6,020,592 AVarian Semiconductor Equipment Associates, Inc. · 2000
- Dose measurement and uniformity monitoring system for ion implantation43US 4,751,393 AVarian Associates, Inc. · 1988
- Dose monitor for plasma doping system43US 6,300,643 B1Varian Semiconductor Equipment Associates, Inc. · 2001
- System for controlling ion implantation dosage in electronic materials37US 4,021,675 AHughes Aircraft Company · 1977
- Ion implantation system35US 5,343,047 ATokyo Electron Limited · 1994