H01J 2237/15
Means for deflecting or directing discharge
H01J2237/15 (Means for deflecting or directing discharge) appears on 987 US grants and 1,049 published applications in this corpus.
Search patents in H01J- Granted patents
- 987
- Published applications
- 1,049
- Assignees
- 273
- Inventors
- 1,780
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 4 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 5 | 0 |
| 1992 | 3 | 0 |
| 1993 | 7 | 0 |
| 1994 | 6 | 0 |
| 1995 | 6 | 0 |
| 1996 | 9 | 0 |
| 1997 | 9 | 0 |
| 1998 | 16 | 0 |
| 1999 | 10 | 0 |
| 2000 | 11 | 0 |
| 2001 | 10 | 8 |
| 2002 | 5 | 10 |
| 2003 | 17 | 15 |
| 2004 | 11 | 23 |
| 2005 | 22 | 20 |
| 2006 | 23 | 35 |
| 2007 | 12 | 34 |
| 2008 | 31 | 44 |
| 2009 | 30 | 35 |
| 2010 | 31 | 35 |
| 2011 | 34 | 29 |
| 2012 | 26 | 24 |
| 2013 | 19 | 27 |
| 2014 | 41 | 37 |
| 2015 | 42 | 73 |
| 2016 | 58 | 59 |
| 2017 | 57 | 38 |
| 2018 | 35 | 33 |
| 2019 | 48 | 65 |
| 2020 | 71 | 71 |
| 2021 | 49 | 63 |
| 2022 | 50 | 53 |
| 2023 | 47 | 62 |
| 2024 | 45 | 57 |
| 2025 | 39 | 53 |
| 2026 | 34 | 46 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 2237/151Electrostatic meansIndexing code268
- H01J 2237/1501Beam alignment means or proceduresIndexing code225
- H01J 2237/152Magnetic meansIndexing code169
- H01J 2237/1504Associated circuitsIndexing code93
- H01J 2237/1502Mechanical adjustmentsIndexing code74
- H01J 2237/1506Tilting or rocking beam around an axis substantially at an angle toIndexing code55
- H01J 2237/1508Combined electrostatic-electromagnetic meansIndexing code55
- H01J 2237/1505Rotating beam around optical axisIndexing code27
Recent patents
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Multipole elements and charged particle microscope systems including the same29 Sep 2026US 12,749,646 B2FEI Company
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Permeance magnetic assembly15 Sep 2026US 12,738,468 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Beam detector, multi-charged-particle-beam irradiation apparatus, and adjustment method for beam detector8 Sep 2026US 12,731,759 B2NuFlare Technology, Inc.
- Ion implanter and ion implantation method8 Oct 2026US 2026/0311963 A1Chongqing Advanced Silicon Technology Co., LTD
- High-performance adaptable sampling system1 Oct 2026US 2026/0302145 A1Tokyo Electron Limited
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Aberration correction reflector apparatus, aberration correction system, and method thereof17 Sep 2026US 2026/0279721 A1Quantum Science Center of Guangdong-Hongkong-Macao Greater Bay Area
- Multipole magnet adjustment system and multipole magnet adjustment method13 Aug 2026US 2026/0237591 A1Kabushiki Kaisha Toshiba
Most cited
By later US patents
- Multijunction photovoltaic cells and panels using a silicon or silicon-germanium active substrate cell for space and terrestrial applications199US 6,340,788 B12002
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Objective lens with deflector plates immersed in electrostatic lens field110US 8,698,093 B1KLA-Tencor Corporation · 2014
- Electromagnet and magnetic field generating apparatus109US 6,365,894 B2Hitachi, Ltd. · 2002
- Electromagnet and magnetic field generating apparatus108US 6,236,043 B1Hitachi, Ltd. · 2001