Aberration correction systems and charged particle microscope systems including the same

An apparatus, comprising:

• a plurality of electrostatic elements configured to deflect an incident charged particle beam along an α-shaped path, wherein the plurality of electrostatic elements comprises a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam, and
• a deflector assembly comprising a corrector electrostatic prism and the plurality of electrostatic multipole elements,
• wherein the plurality of electrostatic multipole elements comprises:
• a first hexapole-generating element configured to generate a first hexapole field;
• a second hexapole-generating element configured to generate a second hexapole field;
• and
• a third hexapole-generating element configured to generate a third hexapole field,
• wherein the deflector assembly defines a deflector optical axis, wherein the second hexapole-generating element is positioned proximate to a midpoint of the deflector optical axis within the corrector electrostatic prism and at a position along the deflector optical axis corresponding to a line focus of the charged particle beam, and wherein the deflector assembly is configured to at least partially correct an axial chromatic aberration in the charged particle beam as the charged particle beam travels along the deflector optical axis.

An apparatus, comprising:

• a plurality of electrostatic elements configured to deflect an incident charged particle beam along an α-shaped path, wherein the plurality of electrostatic elements comprises a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam, and
• a deflector assembly comprising a corrector electrostatic prism and the plurality of electrostatic multipole elements,
• wherein the plurality of electrostatic multipole elements comprises:
• a first hexapole-generating element configured to generate a first hexapole field;
• a second hexapole-generating element configured to generate a second hexapole field;
• a third hexapole-generating element configured to generate a third hexapole field;
• and
• a fourth hexapole-generating element configured to generate a fourth hexapole field,
• wherein each of the second hexapole-generating element and the third hexapole-generating element is positioned at least partially within the corrector electrostatic prism, wherein the deflector assembly defines a deflector optical axis, and wherein the deflector assembly is configured to at least partially correct an axial chromatic aberration in the charged particle beam as the charged particle beam travels along the deflector optical axis.