H01J 2237/1504
Associated circuits
H01J2237/1504 (Associated circuits) appears on 93 US grants and 81 published applications in this corpus.
Search patents in H01J- Granted patents
- 93
- Published applications
- 81
- Assignees
- 52
- Inventors
- 235
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 3 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 0 |
| 2003 | 2 | 1 |
| 2004 | 1 | 4 |
| 2005 | 4 | 2 |
| 2006 | 2 | 1 |
| 2007 | 1 | 4 |
| 2008 | 0 | 2 |
| 2009 | 2 | 1 |
| 2010 | 1 | 2 |
| 2011 | 1 | 1 |
| 2012 | 4 | 1 |
| 2013 | 1 | 2 |
| 2014 | 1 | 1 |
| 2015 | 3 | 4 |
| 2016 | 2 | 3 |
| 2017 | 4 | 7 |
| 2018 | 4 | 1 |
| 2019 | 4 | 5 |
| 2020 | 9 | 8 |
| 2021 | 5 | 3 |
| 2022 | 3 | 6 |
| 2023 | 5 | 9 |
| 2024 | 2 | 5 |
| 2025 | 7 | 4 |
| 2026 | 4 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Distortion optimized multi-beam scanning system26 May 2026US 12,640,334 B2Carl Zeiss MultiSEM GmbH
- Apparatus using enhanced deflectors to manipulate charged particle beams21 Apr 2026US 12,609,264 B2ASML Netherlands B. V.
- Charged particle beam system and control method therefor24 Mar 2026US 12,586,750 B2JEOL Ltd.
- Charged particle assessment tool, inspection method18 Nov 2025US 12,476,069 B2ASML Netherlands B. V.
- Electron-optical element4 Jun 2026US 2026/0155274 A1ASML Netherlands B. V.
- Ultra fast pulser for low energy electron beams21 May 2026US 2026/0142118 A1Euclid Techlabs, LLC
- Charged particle assessment tool, inspection method14 May 2026US 2026/0135058 A1ASML Netherlands B. V.
- Calibration of digital analog converter to control deflectors in charged particle beam system25 Dec 2025US 2025/0391628 A1ASML Netherlands B. V.
- System and method for distortion adjustment during inspection30 Oct 2025US 2025/0336046 A1ASML Netherlands B. V.
Most cited
By later US patents
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method36US 6,919,574 B2Advantest Corporation · 2005
- Charged particle beam treatment apparatus and method of adjusting path length of charged particle beam23US 9,142,385 B1Sumitomo Heavy Industries, Ltd. · 2015
- Electron beam apparatus, and inspection instrument and inspection process thereof22US 6,518,582 B1Nikon Corporation · 2003
- Charged particle beam scanning apparatus21US 4,943,722 ATrialsite Limited · 1990