Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method

An electron beam exposure apparatus for exposing a wafer by electron beams, comprising:

• an electron beam generating section for generating a plurality of electron beams;
• a plurality of deflectors for deflecting the corresponding electron beams;
• a deflection control section for outputting a deflection control signal for causing said deflectors to deflect the electron beams;
• and
• a control signal storage section for storing a value of the deflection control signal output from said deflection control section;
• wherein said control signal storage section and said deflectors are monolithically integrated on a semiconductor substrate;
• wherein said control signal storage section stores values of the plurality of deflection control signals in parallel, connects the plurality of deflectors in series for scanning the deflection control signals through the plurality of deflectors, and outputs the deflection control signals to said deflection control section in series;
• and
• wherein said control signal storage section comprises a shift register including a plurality of flip-flops provided corresponding to said plurality of deflectors, the flip-flops storing thereon values of the corresponding deflection control signals.

An electron beam exposure apparatus for exposing a wafer by electron beams, comprising:

• an electron beam generating section for generating a plurality of electron beams;
• a plurality of deflectors for deflecting the corresponding electron beams;
• a deflection control section for outputting a deflection control signal for causing said deflector to deflect the electron beam;
• and
• a control signal storage section for storing a value of the deflection control signal output from said deflection control section;
• wherein said control signal storage section and said deflectors are monolithically integrated on a semiconductor substrate;
• wherein said control signal storage section stores values of the plurality of deflection control signals in parallel, connects the plurality of deflectors in series for scanning the deflection control signals through the plurality of deflectors, and outputs deflection control signals to said deflection control section in series;
• and
• wherein said deflection control section diagnoses electrical connections between each of said plurality of deflectors and said deflection control section based on the deflection control signals output from said control signal storage section.

A deflection apparatus for deflecting a plurality of electron beams based on a deflection control signal, comprising:

• a control signal storage section storing thereon a value of the deflection control signal;
• and
• a plurality of deflectors for deflecting the corresponding electron beams based on the deflection control signal;
• and
• a signal line for connecting a deflection control section for generating said deflection control signal and said plurality of deflectors, said signal line including a deflection control signal input terminal on a semiconductor substrate on which said control signal storage section being formed;
• wherein said control signal storage section connects the plurality of deflectors in series when self-diagnosing electrical connections in the electron beam exposure apparatus by scanning the deflection control signals through the series connected plurality of deflectors.