Electron beam apparatus, and inspection instrument and inspection process thereof

An electron beam apparatus, comprising:

• electron beam output means for outputting an electron beam,
• a stage irradiated with the electron beam output by the electron beam output means,
• moving means for moving the stage,
• a storage section for storing a stage moving speed predetermined in accordance with the specimen and an output current volume of the electron beam,
• detection means for detecting over exposure of the electron beam when a moving speed of the stage moved by the moving means is smaller than the stage moving speed stored in the storage section, and
• control means for controlling the electron beam output means to prevent the stage from being irradiated with the electron beam when the over exposure of the electron beam is detected by the detection means.

An inspection apparatus for inspecting a specimen by irradiating the specimen with an electron beam, comprising:

• electron beam outputting means for outputting the electron beam and irradiating the specimen with the electron beam,
• image acquisition means for acquiring image information of the specimen based on a secondary beam generated from the specimen,
• a storage section for storing a contrast ratio predetermined on the basis of the specimen and an output current volume of the electron beam,
• detection means for detecting over exposure of the electron beam when the contrast ratio of the image information acquired by the image acquisition means is greater than the contrast ratio stored in the storage section, and
• control means for controlling the electron beam outputting means to prevent the electron beam from being applied to the specimen.

An inspection method for inspecting a specimen by irradiating the specimen with an electron beam, comprising:

• outputting the electron beam to irradiate the specimen with the electron beam,
• acquiring image information of the specimen based on a secondary beam generated from the specimen,
• moving a stage on which the specimen is placed,
• detecting over exposure of the electron beam when a moving speed of the stage is smaller than a stage moving speed predetermined in accordance with the specimen and an output current volume of the electron beam, and
• controlling the electron beam to prevent the stage from being irradiated with the electron beam when the over exposure of the electron beam is detected.

An electron beam apparatus for irradiating a specimen with an electron beam, comprising:

• an electron beam source that outputs the electron beam,
• a measuring system that measures a dosage of the electron beam irradiated per unit area of the specimen,
• a memory that stores a predetermined dosage per unit area for the specimen,
• a stage on which the specimen is placed,
• a drive that moves the stage, and
• a controller that determines that an over exposure of the electron beam exists when the dosage per unit area measured by the measuring system is greater than the dosage per unit area stored in the memory, and the controls the electron beam source to reduce the dosage per unit area of the electron beam lower than the dosage per unit area stored in the memory, when the over exposure of the electron beam is determined to exist,
• wherein the measuring system measures the dosage per unit area in accordance with an output current volume of the electron beam and a moving speed of the stage moved by the drive.

An electron beam apparatus, comprising:

• an electron beam source that outputs an electron beam,
• a stage irradiated with the electron beam output by the electron beam source,
• a drive that moves the stage,
• a memory that stores a stage moving speed predetermined in accordance with the specimen and an output current volume of the electron beam, and
• a controller that determines that over exposure of the electron beam exists when a moving speed of the stage moved by the drive is smaller than the stage moving speed stored in the memory, and that controls the electron beam source to prevent the stage from being irradiated with the electron beam when the over exposure of the electron beam is determined to exist.

An inspection apparatus for inspection a specimen by irradiating the specimen with an electron beam, comprising:

• an electron beam source that outputs the electron beam and irradiates the specimen with the electron beam,
• an image processor that acquires image information of the specimen based on a secondary beam generated from the specimen,
• a memory that stores a contrast ratio predetermined on the basis of the specimen and an output current volume of the electron beam, and
• a controller that determines that over exposure of the electron beam exists when the contrast ratio of the image information acquired by the image processor is greater than the contrast ratio stored in the memory, and controls the electron beam source to prevent the electron beam from being applied to the specimen.