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AssigneeSumitomo Heavy Industries, Ltd.
InventorShinji Iwanaga
Estimating the term…
A charged particle beam treatment apparatus includes: an accelerator configured to emit a charged particle beam by accelerating charged particles; an irradiation portion configured to irradiate an irradiation object with the charged particle beam through a scanning method; a transport line configured to transport the charged particle beam emitted from the accelerator to the irradiation portion; an energy adjusting portion configured to adjust energy of the charged particle beam; an electromagnet which is provided in the irradiation portion or the transport line; an electromagnet power source which is connected to the electromagnet; and a control portion. Semiconductors are connected between the electromagnet power source and the electromagnet in series. When switching a layer of the irradiation object to be irradiated with the charged particle beam, the control portion reduces the energy of the charged particle beam by controlling the energy adjusting portion and increases a resistance of the semiconductors.
A charged particle beam treatment apparatus comprising:
A method of adjusting a path length of a charged particle beam in which the path length of the charged particle beam which is emitted by an irradiation portion is adjusted using the charged particle beam treatment apparatus,
Dependencies are inferred from the claim text.