H01J 2237/1508
Combined electrostatic-electromagnetic means
H01J2237/1508 (Combined electrostatic-electromagnetic means) appears on 55 US grants and 61 published applications in this corpus.
Search patents in H01J- Granted patents
- 55
- Published applications
- 61
- Assignees
- 25
- Inventors
- 113
- Latest grant
- 24 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 2 |
| 2004 | 1 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 3 |
| 2007 | 0 | 3 |
| 2008 | 5 | 1 |
| 2009 | 0 | 1 |
| 2010 | 1 | 2 |
| 2011 | 0 | 4 |
| 2012 | 1 | 1 |
| 2013 | 2 | 0 |
| 2014 | 3 | 3 |
| 2015 | 3 | 1 |
| 2016 | 4 | 7 |
| 2017 | 5 | 2 |
| 2018 | 1 | 3 |
| 2019 | 7 | 9 |
| 2020 | 4 | 4 |
| 2021 | 6 | 3 |
| 2022 | 3 | 4 |
| 2023 | 2 | 2 |
| 2024 | 0 | 2 |
| 2025 | 3 | 2 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam system and control method therefor24 Mar 2026US 12,586,750 B2JEOL Ltd.
- Electron optical column and method for directing a beam of primary electrons onto a sample10 Mar 2026US 12,573,581 B2ASML Netherlands B. V.
- High energy implanter with small footprint30 Sep 2025US 12,431,332 B2Axcelis Technologies, Inc.
- In-lens wafer PE-charging and inspection with multiple beams29 Jul 2025US 12,374,524 B2ASML Netherlands B. V.
- System and method for alignment of secondary beams in multi-beam inspection apparatus15 Apr 2025US 12,278,081 B2ASML Netherlands B. V.
- High energy implanter with small footprint29 Jan 2026US 2026/0031302 A1Axcelis Technologies, Inc.
- High energy implanter with small footprint27 Mar 2025US 2025/0104965 A1Axcelis Technologies, Inc.
- Charged Particle Beam Device, and Beam Deflection Method in Charged Particle Beam Device20 Feb 2025US 2025/0062096 A1Hitachi High-Tech Corporation
- Multi-electron beam image acquiring apparatus and multi-electron beam image acquiring method7 Mar 2024US 2024/0079200 A1NuFlare Technology, Inc.
- Electron optical column and method for directing a beam of primary electrons onto a sample15 Feb 2024US 2024/0055219 A1ASML Netherlands B. V.
Most cited
By later US patents
- Multi-beam scanning electron beam device and methods of using the same48US 9,153,413 B2Applied Materials Israel Ltd. · 2015
- Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams18US 7,105,839 B22006
- Electron beam apparatus and a device manufacturing method using the same apparatus17US 7,385,197 B2Ebara Corporation · 2008
- Method and system for ion beam containment in an ion beam guide11US 6,703,628 B2Axceliss Technologies, Inc · 2004
- Inspection method and inspection system using charged particle beam11US 7,462,828 B2Hitachi High-Technologies Corporation · 2008