H01J 2237/151
Electrostatic means
H01J2237/151 (Electrostatic means) appears on 268 US grants and 281 published applications in this corpus.
Search patents in H01J- Granted patents
- 268
- Published applications
- 281
- Assignees
- 111
- Inventors
- 512
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 5 | 0 |
| 1999 | 2 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 3 |
| 2002 | 0 | 2 |
| 2003 | 6 | 7 |
| 2004 | 5 | 9 |
| 2005 | 7 | 4 |
| 2006 | 8 | 7 |
| 2007 | 3 | 12 |
| 2008 | 9 | 12 |
| 2009 | 11 | 13 |
| 2010 | 10 | 7 |
| 2011 | 6 | 8 |
| 2012 | 9 | 4 |
| 2013 | 5 | 6 |
| 2014 | 10 | 7 |
| 2015 | 9 | 13 |
| 2016 | 8 | 10 |
| 2017 | 10 | 9 |
| 2018 | 6 | 2 |
| 2019 | 14 | 20 |
| 2020 | 17 | 12 |
| 2021 | 7 | 16 |
| 2022 | 13 | 20 |
| 2023 | 10 | 23 |
| 2024 | 16 | 27 |
| 2025 | 15 | 13 |
| 2026 | 21 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Multipole elements and charged particle microscope systems including the same29 Sep 2026US 12,749,646 B2FEI Company
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Adjustable permanent magnetic lens having thermal control device11 Aug 2026US 12,706,270 B2IMS Nanofabrication GmbH
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- High-performance adaptable sampling system1 Oct 2026US 2026/0302145 A1Tokyo Electron Limited
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Multi-beam generating unit with increased focusing power30 Jul 2026US 2026/0221374 A1
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
- Charged particle beam device23 Jul 2026US 2026/0213117 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Objective lens with deflector plates immersed in electrostatic lens field110US 8,698,093 B1KLA-Tencor Corporation · 2014
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Twin beam charged particle column and method of operating thereof61US 8,378,299 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2013
- Method and apparatus for image alignment in ion lithography58US 4,967,088 AIMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. · 1990