H01J 2237/1516
Multipoles
H01J2237/1516 (Multipoles) appears on 101 US grants and 107 published applications in this corpus.
Search patents in H01J- Granted patents
- 101
- Published applications
- 107
- Assignees
- 50
- Inventors
- 187
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 3 | 4 |
| 2005 | 3 | 1 |
| 2006 | 1 | 1 |
| 2007 | 1 | 2 |
| 2008 | 1 | 0 |
| 2009 | 2 | 2 |
| 2010 | 0 | 1 |
| 2011 | 1 | 3 |
| 2012 | 2 | 0 |
| 2013 | 0 | 2 |
| 2014 | 4 | 2 |
| 2015 | 2 | 3 |
| 2016 | 3 | 5 |
| 2017 | 7 | 5 |
| 2018 | 2 | 1 |
| 2019 | 6 | 8 |
| 2020 | 9 | 9 |
| 2021 | 3 | 6 |
| 2022 | 7 | 11 |
| 2023 | 7 | 9 |
| 2024 | 8 | 18 |
| 2025 | 5 | 7 |
| 2026 | 13 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Multipole elements and charged particle microscope systems including the same29 Sep 2026US 12,749,646 B2FEI Company
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Adjustable permanent magnetic lens having thermal control device11 Aug 2026US 12,706,270 B2IMS Nanofabrication GmbH
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Multi-beam generating unit with increased focusing power30 Jul 2026US 2026/0221374 A1
- Focused ion beam systems including multipole elements and deceleration elements11 Jun 2026US 2026/0162925 A1FEI Company
- Collation system28 May 2026US 2026/0148929 A1NEC Corporation
- Modular optical bench assembly14 May 2026US 2026/0135059 A1
Most cited
By later US patents
- Objective lens with deflector plates immersed in electrostatic lens field110US 8,698,093 B1KLA-Tencor Corporation · 2014
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Method and apparatus for image alignment in ion lithography58US 4,967,088 AIMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. · 1990
- Masked ion beam lithography system and method34US 4,757,208 AHughes Aircraft Company · 1988
- Apparatus of plural charged-particle beams33US 10,643,820 B2Hermes Microvision, Inc. · 2020