Multi-beam generating unit with increased focusing power
OwnerAlexander HUEBEL, Yanko SAROV +3inventors
InventorsAlexander HUEBEL, Yanko SAROV, Wolfgang SINGER, Sandra VOGEL, Dirk ZEIDLER
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Abstract
A multipole array for a multi-beam system that can exhibit better evacuation, less contamination risk, and/or increased manipulation range via a mechanism comprising rounded edges within vacuum gaps, deep pockets formed in conducting material, and/or electrodes within vacuum gaps for generating repelling or attracting forces to charged particles.
Claims28
A multi-pole array configured to manipulate a plurality of primary charged particle beamlets, the multi-pole array comprising:
- a plurality of first apertures, each aperture configured to transmit one of the plurality of primary charged particle beamlets;
- at each aperture, first and second electrodes configured to define a multipole element and configured to be connected to a control unit to individually control a primary charged particle beamlet,
- wherein:
- for each of the first and second electrodes:
- the electrode has a radial thickness;
- the electrode has an inner surface within the aperture;
- the electrode is embedded in a conducting material;
- the electrode is isolated from the conducting material by ring segments of an insulating material between the electrode and the conducting material;
- and
- a vacuum gap with side surfaces is between the first and second electrodes;
- the vacuum gap has a width;
- the vacuum gap has a depth;
- the vacuum gap has an aspect ratio equal to the radial thickness of the first and second electrodes divided by the width of the vacuum gap;
- and
- the depth of the vacuum gap is greater than a depth of the insulating material, thereby defining a pocket in the conducting material.
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A multi-pole array configured to manipulate a plurality of primary charged particle beamlets, the multi-pole array comprising:
- a plurality of first apertures, each aperture configured to transmit one of the plurality of primary charged particle beamlets;
- at each aperture, first and second electrodes configured be connected to a control unit to individually control a primary charged particle beamlet,
- wherein:
- for each of the first and second electrodes:
- the electrode has an inner surface within the aperture;
- the electrode is embedded in a conducting material;
- a vacuum gap with side surfaces is between the first and second electrodes;
- an additional electrode is within the vacuum gap in a direction of a line of sight with the primary charged particle beamlet to be transmitted by the aperture;
- the additional electrode configured to be connected to a voltage supply to provide a voltage to generate a repelling or attracting force to charged particles entering the vacuum gap.
-42. (canceled)
A multi-pole array configured to manipulate a plurality of primary charged particle
- beamlets, the multi-pole array comprising:
- a plurality of apertures, each aperture configured to transmit one of the plurality of primary charged particle beamlets;
- at each aperture, first and second electrodes configured be connected to a control unit to individually control a primary charged particle beamlet,
- wherein:
- for each of the first and second electrodes:
- the electrode has an inner surface within the aperture;
- the electrode comprises a layer of isolating material on a side opposite the inner surface of the electrode;
- the layer of the isolating material is covered by a conducting material configured to be connected to a voltage supply to provide a voltage or ground level;
- a vacuum gap with side surfaces is between the first and second electrodes;
- a first outer layer covers the first and second electrodes from a direction of the incident primary beamlets;
- a plurality of second or vacuum apertures is between the first and second electrodes or is between different apertures of the plurality of the apertures.
-55. (canceled)
Dependencies are inferred from the claim text.