Focused ion beam systems including multipole elements and deceleration elements
AssigneeFEI Company
InventorsGalen Gledhill, Alexander Henstra
Life of this patent
Estimating the term…
Loading patent…
AssigneeFEI Company
InventorsGalen Gledhill, Alexander Henstra
Estimating the term…
Charged particle microscope systems including multipole optics are described. An ion-optical column can include an aberration correction system. The aberration correction system can be disposed on an axis and can include a multipole condenser. The multipole condenser can include one or more condenser quadrupole-generating elements. The aberration correction system can also include a multipole objective. The multipole objective can include a plurality of objective multipole elements. The ion-optical column can include an objective lens assembly, disposed on the axis. The ion-optical column can also include a deceleration element. The deceleration element can be disposed on the axis between at least a portion of the aberration correction system and a sample position external to the charged particle optical column.
An ion-optical column, comprising:
A charged particle beam system, comprising:
Dependencies are inferred from the claim text.