Charged particle beam device

A charged particle beam device comprising:

• a sample stage on which a sample is placed;
• a charged particle optical system that includes a charged particle beam source, an objective lens, an electric field suppression electrode, and a multipole electrode, the objective lens having an upper magnetic path, a lower magnetic path, and a coil, and focusing a charged particle beam emitted from the charged particle beam source on the sample, the electric field suppression electrode being disposed between the objective lens and the sample stage, positioned below the principal plane of the objective lens, and having an opening through which the charged particle beam passes, the multipole electrode being disposed between the objective lens and the electric field suppression electrode, positioned below the principal plane of the objective lens, having an opening through which the charged particle beam passes, and generating an electrostatic deflection field or an electrostatic pole field for the charged particle beam;
• a boosting voltage source that applies a boosting voltage to the upper magnetic path;
• a retarding voltage source that applies a retarding voltage to the sample, the lower magnetic path, and the electric field suppression electrode;
• and
• a correction voltage source that generates an electrostatic deflection field or an electrostatic multipole field on the multipole electrode.