Apparatus for generating a plurality of beamlets
AssigneeMapper Lithography IP B.V.
InventorPieter Kruit
Life of this patent
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Abstract
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
Claims30
An apparatus for generating a plurality of charged particle beamlets, comprising:
- a charged particle source for generating a diverging charged particle beam;
- a converging means for refracting said diverging charged particle beam;
- a lens array comprising a plurality of lenses, located between said charged particle source and said converging means;
- and
- splitting means for splitting said charged particle beam in a plurality of charged particle beamlets.
An apparatus for generating a plurality of charged particle beamlets, comprising:
- a charged particle source for generating a diverging charged particle beam;
- a converging means for refracting said diverging charged particle beam;
- a lens array comprising a plurality of lenses, located between said charged particle source and said converging means, wherein said lens array is concave with respect to said source;
- and splitting means for splitting said charged particle beam in a plurality of charged particle beamlets.
Dependencies are inferred from the claim text.