US 2026/0213113 A1 · MULTI-CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND MULTI-CHARGED PARTICLE BEAM IRRADIATION METHOD

Abstract

In one embodiment, a multi-charged particle beam irradiation apparatus includes a blanking aperture array substrate having a plurality of blankers that perform blanking deflection on each beam of the multi-beam, an illumination lens that forms a crossover by focusing the multi-beam which passes through the blanking aperture array substrate, a stopping aperture substrate disposed at a position of the crossover and configured to block a beam which is deflected to be in a beam-OFF state, a stage on which a substrate to be irradiated with a beam passing through the stopping aperture substrate is placed, an electrostatic deflector disposed in proximity to the stopping aperture substrate, between the blanking aperture array substrate and the stopping aperture substrate, and a voltage control circuit configured to form an electric field perpendicular to a trajectory central axis of the multi-beam by applying a predetermined voltage to the electrostatic deflector.

Claims20

Dependent claims

A multi-charged particle beam irradiation apparatus comprising:

a charged particle source that emits a charged particle beam;
a shaping aperture array substrate having a plurality of openings through which the charged particle beam passes to form a multi-beam;
a blanking aperture array substrate having a plurality of blankers that perform blanking deflection on each beam of the multi-beam;
an illumination lens that forms a crossover by focusing the multi-beam which passes through the blanking aperture array substrate;
a stopping aperture substrate disposed at a position of the crossover and configured to block a beam which is deflected to be in a beam-OFF state by the plurality of blankers;
a stage on which a substrate to be irradiated with a beam passing through the stopping aperture substrate is placed;
an electrostatic deflector disposed in proximity to the stopping aperture substrate, between the blanking aperture array substrate and the stopping aperture substrate;
and
a voltage control circuit configured to form an electric field perpendicular to a trajectory central axis of the multi-beam by applying a predetermined voltage to the electrostatic deflector.

6 more elements

A multi-charged particle beam irradiation method comprising:

a step of emitting a charged particle beam using a charged particle source;
a step of forming a multi-beam by letting the charged particle beam pass through a plurality of openings provided in a shaping aperture array substrate;
a step of performing blanking deflection on each beam in the multi-beam using a blanking aperture array substrate including a plurality of blankers;
a step of forming a crossover by focusing the multi-beam which passes through the blanking aperture array substrate;
a step of blocking a beam, which has been deflected to a beam-OFF state by the blanking aperture array substrate, by a stopping aperture substrate disposed at a position of the crossover;
a step of irradiating a predetermined position of a substrate placed on a stage with a beam which has passed through the stopping aperture substrate;
and
a step of forming an electric field in a direction perpendicular to a trajectory central axis of the multi-beam by applying a predetermined voltage to an electrostatic deflector disposed between the blanking aperture array substrate and the stopping aperture substrate and in proximity to the stopping aperture substrate.

5 more elements

Dependencies are inferred from the claim text.

Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method

Life of this patent

Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method

Life of this patent

Abstract

Claims20