H01J 2237/1514
Prisms
H01J2237/1514 (Prisms) appears on 41 US grants and 34 published applications in this corpus.
Search patents in H01J- Granted patents
- 41
- Published applications
- 34
- Assignees
- 25
- Inventors
- 77
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 1 |
| 2003 | 3 | 2 |
| 2004 | 1 | 2 |
| 2005 | 1 | 1 |
| 2006 | 3 | 3 |
| 2007 | 1 | 1 |
| 2008 | 1 | 5 |
| 2009 | 4 | 5 |
| 2010 | 6 | 2 |
| 2011 | 2 | 3 |
| 2012 | 1 | 1 |
| 2013 | 3 | 1 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 2 |
| 2020 | 2 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 1 |
| 2025 | 0 | 2 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Multipole elements and charged particle microscope systems including the same29 Sep 2026US 12,749,646 B2FEI Company
- Interference optical system unit, charged particle beam interference apparatus, and method for observing charged particle beam interference image8 Sep 2020US 10,770,264 B2Riken
- Electron microscope for magnetic field measurement and magnetic field measurement method21 Apr 2020US 10,629,410 B2Hitachi, Ltd.
- Interference electron microscope22 Jul 2014US 8,785,851 B2Hitachi, Ltd.
- Focused ion beam systems including multipole elements and deceleration elements11 Jun 2026US 2026/0162925 A1FEI Company
- Aberration correction systems and charged particle microscope systems including the same3 Apr 2025US 2025/0112018 A1FEI Company
- Multipole elements and charged particle microscope systems including the same3 Apr 2025US 2025/0112019 A1FEI Company
- Techniques for electron energy loss spectroscopy at high energy17 Oct 2024US 2024/0347314 A1FEI Company
- Interference optical system unit, charged particle beam interference apparatus, and method for observing charged particle beam interference image26 Sep 2019US 2019/0295816 A1Riken
Most cited
By later US patents
- Twin beam charged particle column and method of operating thereof61US 8,378,299 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2013
- Charged particle beam device40US 5,221,844 AU. S. Philips Corporation · 1993
- Phase-contrast electron microscope and phase plate therefor34US 5,814,815 AHitachi, Ltd. · 1998
- Reflection electron holography apparatus32US 4,998,788 AHitachi, Ltd. · 1991
- Electron holography apparatus25US 4,935,625 AHitachi, Ltd. · 1990