H01J 2237/004
Charge control of objects or beams
H01J2237/004 (Charge control of objects or beams) appears on 583 US grants and 558 published applications in this corpus.
Search patents in H01J- Granted patents
- 583
- Published applications
- 558
- Assignees
- 186
- Inventors
- 1,321
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 3 | 0 |
| 1994 | 8 | 0 |
| 1995 | 11 | 0 |
| 1996 | 6 | 0 |
| 1997 | 5 | 0 |
| 1998 | 8 | 0 |
| 1999 | 11 | 0 |
| 2000 | 10 | 0 |
| 2001 | 13 | 2 |
| 2002 | 14 | 19 |
| 2003 | 29 | 7 |
| 2004 | 17 | 22 |
| 2005 | 16 | 17 |
| 2006 | 14 | 24 |
| 2007 | 17 | 21 |
| 2008 | 17 | 25 |
| 2009 | 22 | 28 |
| 2010 | 21 | 23 |
| 2011 | 19 | 27 |
| 2012 | 19 | 20 |
| 2013 | 30 | 14 |
| 2014 | 29 | 19 |
| 2015 | 18 | 23 |
| 2016 | 15 | 20 |
| 2017 | 18 | 15 |
| 2018 | 21 | 24 |
| 2019 | 22 | 27 |
| 2020 | 28 | 31 |
| 2021 | 21 | 20 |
| 2022 | 18 | 23 |
| 2023 | 14 | 27 |
| 2024 | 19 | 26 |
| 2025 | 19 | 34 |
| 2026 | 16 | 20 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- System and method for inspection by deflector control in a charged particle system22 Sep 2026US 12,744,178 B2ASML Netherlands B. V.
- Fiber Fabry-Perot Cavity laser phase plate for charged particle microscopy1 Sep 2026US 12,725,756 B2FEI Company
- Charged particle beam device and imaging method18 Aug 2026US 12,712,149 B2Hitachi High-Tech Corporation
- System and method for plasma processing18 Aug 2026US 12,712,152 B2Tokyo Electron Limited
- Method, apparatus, and system for wafer grounding28 Jul 2026US 12,696,725 B2ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- System and Method for Extending Faraday Setup Cup Life Time by Scanning Ion Beam during Setup1 Oct 2026US 2026/0302125 A1APPLIED Materials.Inc.
- Electron beam irradiation apparatus and contact point conductivity inspection method24 Sep 2026US 2026/0290746 A1NuFlare Technology, Inc.
- Multi-beam charged particle microscope for inspection with reduced charging effects17 Sep 2026US 2026/0279715 A1
- Reactor design optimization with dc bias pulsing to pedestal30 Jul 2026US 2026/0221397 A1Lam Research Corporation
Most cited
By later US patents
- Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same425US 7,799,706 B2Sungkyunkwan University Foundation for Corporate Collaboration · 2010
- Microstructure defect detection182US 6,232,787 B1Schlumberger Technologies, Inc. · 2001
- Enhanced reactive DC sputtering system162US 5,718,813 AAdvanced Energy Industries, Inc. · 1998
- Plasma immersion ion implantation (PI.sup.3) apparatus149US 5,354,381 AVarian Associates, Inc. · 1994
- Thin film DC plasma processing system131US 5,427,669 AAdvanced Energy Industries, Inc. · 1995