Reactor design optimization with dc bias pulsing to pedestal
AssigneeLam Research Corporation
InventorsShaun Tyler Smith, Lee Chen, Neil M.P. Benjamin
Life of this patent
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Abstract
A plasma processing system, including a main plasma chamber configured for generating a main plasma, wherein the plasma chamber includes a bottom electrode located within an electrostatic chuck (ESC). The system including a direct current (DC) generator providing a pulsed DC bias signal to the bottom electrode over a plurality of cycles. The plasma processing system including a neutralization source that is external to the main plasma chamber, wherein the neutralization source is configured for providing a neutralization current into the main plasma chamber, wherein the neutralization current is electrically coupled to the main plasma.
Claims20
A system, comprising:
- a main plasma chamber configured for generating a main plasma, wherein the plasma chamber includes a bottom electrode located within an electrostatic chuck (ESC);
- a direct current (DC) generator providing a pulsed DC bias signal to the bottom electrode over a plurality of cycles;
- and
- a neutralization source that is external to the main plasma chamber, wherein the neutralization source is configured for providing a neutralization current into the main plasma chamber,
- wherein the neutralization current is electrically coupled to the main plasma.
A system, comprising:
- a main plasma chamber configured for generating a main plasma, wherein the main plasma chamber includes a bottom electrode located within an electrostatic chuck (ESC);
- a direct current (DC) generator providing a pulsed DC bias signal to the bottom electrode over a plurality of cycles, wherein the pulsed DC bias signal has an ON period and an OFF period in each cycle of the plurality of cycles;
- and
- a secondary plasma chamber that is external to the main plasma chamber, wherein the secondary plasma chamber is configured for generating a secondary plasma that is more negatively charged than the main plasma;
- a pump for delivering the secondary plasma into the main plasma chamber in order to provide a neutralization current that is electrically coupled to the main plasma.
A method, comprising:
- generating a main plasma in a main plasma chamber, wherein the main plasma chamber includes a bottom electrode located within an electrostatic chuck (ESC);
- generating a pulsed DC bias signal that is delivered to the bottom electrode over a plurality of cycles;
- and
- providing a neutralization current that is generated from a neutralization source that is external to the main plasma chamber,
- wherein the neutralization current is electrically coupled to the main plasma.
Dependencies are inferred from the claim text.