H01J 2237/0048
Charging arrangements
H01J2237/0048 (Charging arrangements) appears on 87 US grants and 108 published applications in this corpus.
Search patents in H01J- Granted patents
- 87
- Published applications
- 108
- Assignees
- 40
- Inventors
- 214
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2001 | 1 | 0 |
| 2002 | 0 | 2 |
| 2003 | 2 | 0 |
| 2004 | 2 | 2 |
| 2005 | 1 | 1 |
| 2006 | 0 | 4 |
| 2007 | 2 | 6 |
| 2008 | 3 | 2 |
| 2009 | 5 | 5 |
| 2010 | 3 | 1 |
| 2011 | 6 | 6 |
| 2012 | 2 | 4 |
| 2013 | 6 | 2 |
| 2014 | 1 | 2 |
| 2015 | 1 | 3 |
| 2016 | 3 | 4 |
| 2017 | 2 | 2 |
| 2018 | 4 | 2 |
| 2019 | 4 | 3 |
| 2020 | 2 | 13 |
| 2021 | 9 | 6 |
| 2022 | 5 | 9 |
| 2023 | 4 | 9 |
| 2024 | 5 | 7 |
| 2025 | 11 | 7 |
| 2026 | 3 | 6 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- System and method for inspection by deflector control in a charged particle system22 Sep 2026US 12,744,178 B2ASML Netherlands B. V.
- Charged particle beam device and imaging method18 Aug 2026US 12,712,149 B2Hitachi High-Tech Corporation
- Method and apparatus for non-invasive, non-intrusive, and un-grounded, simultaneous corona deposition and SHG measurements24 Feb 2026US 12,562,333 B2FemtoMetrix, Inc.
- Method and apparatus for digital control of ion energy distribution in a plasma23 Dec 2025US 12,505,982 B2APPLIED Materials.Inc.
- Systems and methods for charged particle flooding to enhance voltage contrast defect signal9 Dec 2025US 12,494,342 B2ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Electron beam irradiation apparatus and contact point conductivity inspection method24 Sep 2026US 2026/0290746 A1NuFlare Technology, Inc.
- Charged particle beam device and inspection method using same2 Jul 2026US 2026/0188605 A1Hitachi High-Tech Corporation
- Photo-electrical evolution defect inspection9 Apr 2026US 2026/0100327 A1ASML Netherlands B. V.
- Substrate processing apparatus and substrate processing method5 Mar 2026US 2026/0066221 A1SCREEN Holdings Co., Ltd.
Most cited
By later US patents
- Microstructure defect detection182US 6,232,787 B1Schlumberger Technologies, Inc. · 2001
- Charge-control pre-scanning for e-beam imaging28US 7,253,410 B1KLA-Tencor Technologies Corporation · 2007
- Charge control apparatus and measurement apparatus equipped with the charge control apparatus27US 7,683,319 B2Hitachi High-Technologies Corporation · 2010
- Inspection device27US 8,497,476 B2Ebara Corporation · 2013
- Apparatus and methods of controlling surface charge and focus24US 6,828,571 B1KLA-Tencor Technologies Corporation · 2004