US 12,505,982 B2 · Method and apparatus for digital control of ion energy distribution in a plasma

Abstract

Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. Embodiments of the disclosure include an apparatus and method for generating a pseudo-staircase waveform that includes coupling, during a first phase of generating a waveform, a first voltage supply to an output node; coupling, during a second phase of generating the waveform, a first capacitor between the output node and an electrical ground node; and coupling during a third phase of generating the waveform, the first capacitor and a second capacitor in a series path between the output node and the electrical ground node.

Claims20

Dependent claims

A waveform generator, comprising:

a first voltage supply;
a first switch coupled between the first voltage supply and an output node of the waveform generator;
a second switch;
and
a capacitor array, wherein the second switch is coupled between the output node and the capacitor array, wherein the capacitor array comprises:
a first capacitor coupled to the second switch;
a third switch coupled between the first capacitor and an electrical ground node;
a second capacitor selectively coupled to a node between the first capacitor and the third switch;
and
a fourth switch coupled between the second capacitor and the electrical ground node.

7 more elements

Dependencies are inferred from the claim text.

Method and apparatus for digital control of ion energy distribution in a plasma

Life of this patent

Method and apparatus for digital control of ion energy distribution in a plasma

Life of this patent

Abstract

Claims20