H01J 2237/153
Correcting image defects
Official title: Correcting image defects, e.g. stigmators
H01J2237/153 (Correcting image defects) appears on 625 US grants and 700 published applications in this corpus.
Search patents in H01J- Granted patents
- 625
- Published applications
- 700
- Assignees
- 145
- Inventors
- 944
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 4 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 6 | 0 |
| 1998 | 5 | 0 |
| 1999 | 6 | 0 |
| 2000 | 10 | 0 |
| 2001 | 4 | 0 |
| 2002 | 3 | 7 |
| 2003 | 7 | 11 |
| 2004 | 8 | 10 |
| 2005 | 10 | 16 |
| 2006 | 14 | 25 |
| 2007 | 9 | 28 |
| 2008 | 27 | 31 |
| 2009 | 21 | 31 |
| 2010 | 22 | 22 |
| 2011 | 24 | 23 |
| 2012 | 22 | 23 |
| 2013 | 28 | 22 |
| 2014 | 29 | 17 |
| 2015 | 24 | 16 |
| 2016 | 23 | 24 |
| 2017 | 23 | 24 |
| 2018 | 21 | 19 |
| 2019 | 29 | 40 |
| 2020 | 33 | 39 |
| 2021 | 28 | 39 |
| 2022 | 39 | 47 |
| 2023 | 38 | 50 |
| 2024 | 31 | 49 |
| 2025 | 34 | 56 |
| 2026 | 36 | 31 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Deflector for a charged particle beam apparatus, deflecting system, charged particle beam apparatus, and method of fabricating a deflector6 Oct 2026US 12,755,923 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Correcting for grid distortion8 Oct 2026US 2026/0311956 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Charged particle beam device and method17 Sep 2026US 2026/0279720 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Aberration correction reflector apparatus, aberration correction system, and method thereof17 Sep 2026US 2026/0279721 A1Quantum Science Center of Guangdong-Hongkong-Macao Greater Bay Area
- Aberration corrector, charged particle beam device including same, and control method for controlling same10 Sep 2026US 2026/0269170 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Electron beam exposure apparatus and method, and device manufacturing method80US 5,834,783 ACanon Kabushiki Kaisha · 1998
- Electron beam exposure apparatus and method, and device manufacturing method73US 6,323,499 B1Canon Kabushiki Kaisha · 2001
- Charged-particle beam exposure system and method67US 6,064,807 AFujitsu Limited · 2000