H01J 2237/1536
Image distortions due to scanning
H01J2237/1536 (Image distortions due to scanning) appears on 92 US grants and 107 published applications in this corpus.
Search patents in H01J- Granted patents
- 92
- Published applications
- 107
- Assignees
- 36
- Inventors
- 231
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 2 |
| 2005 | 1 | 3 |
| 2006 | 5 | 7 |
| 2007 | 1 | 7 |
| 2008 | 7 | 4 |
| 2009 | 7 | 2 |
| 2010 | 1 | 0 |
| 2011 | 2 | 4 |
| 2012 | 2 | 5 |
| 2013 | 2 | 4 |
| 2014 | 5 | 1 |
| 2015 | 3 | 3 |
| 2016 | 4 | 3 |
| 2017 | 1 | 3 |
| 2018 | 2 | 4 |
| 2019 | 6 | 8 |
| 2020 | 9 | 8 |
| 2021 | 7 | 4 |
| 2022 | 3 | 4 |
| 2023 | 4 | 7 |
| 2024 | 5 | 6 |
| 2025 | 6 | 13 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Beam position displacement correction in charged particle inspection15 Sep 2026US 12,738,445 B2ASML Netherlands B. V.
- Distortion optimized multi-beam scanning system26 May 2026US 12,640,334 B2Carl Zeiss MultiSEM GmbH
- Charged particle assessment tool, inspection method18 Nov 2025US 12,476,069 B2ASML Netherlands B. V.
- Charged particle beam device and scan waveform generation method18 Nov 2025US 12,476,070 B2Hitachi High-Tech Corporation
- Multi-beam digital scan and image acquisition30 Sep 2025US 12,431,324 B2Carl Zeiss MultiSEM GmbH
- Correcting for grid distortion8 Oct 2026US 2026/0311956 A1ASML Netherlands B. V.
- Augmenting sem imaging output2 Jul 2026US 2026/0188608 A1Applied Materials Israel Ltd.
- Correcting scan data25 Jun 2026US 2026/0179875 A1ASML Netherlands B. V.
- Charged particle assessment tool, inspection method14 May 2026US 2026/0135058 A1ASML Netherlands B. V.
- Monitoring of imaging parameters of scanning electron microscopy18 Dec 2025US 2025/0385069 A1
Most cited
By later US patents
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006
- Charged particle beam scanning method and charged particle beam apparatus46US 7,598,497 B2Hitachi High-Technologies Corporation · 2009
- Apparatus and method for E-beam dark field imaging45US 7,141,791 B2KLA-Tencor Technologies Corporation · 2006
- Charged particle beam system and method35US 10,896,800 B2Carl Zeiss MultiSEM GmbH · 2021
- Apparatus of plural charged-particle beams33US 10,879,031 B2ASML Netherlands B. V. · 2020