Beam position displacement correction in charged particle inspection

An apparatus for correcting inspection image error, comprising:

• a memory storing a set of instructions;
• and
• at least one processor configured to execute the set of instructions to cause the apparatus to perform:
• acquiring a set of first beam positions on a test wafer while a wafer stage supporting the test wafer moves at a first velocity;
• acquiring a set of second beam positions, corresponding to the set of first beam positions, on the test wafer while the wafer stage moves at a second velocity;
• calculating a beam position displacement of a beam while the wafer stage moves at a third velocity in a range of velocities from the first velocity to the second velocity;
• and
• adjusting a beam position of the beam based on the calculated beam position displacement.

A non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of a computing device to cause the computing device to perform operations for correcting inspection image, the operations comprising:

• acquiring a set of first beam positions on a test wafer while a wafer stage supporting the test wafer moves at a first velocity;
• acquiring a set of second beam positions, corresponding to the set of first beam positions, on the test wafer while the wafer stage moves at a second velocity;
• calculating a beam position displacement of a beam while the wafer stage moves at a third velocity in a range of velocities from the first velocity to the second velocity;
• and
• adjusting a beam position of the beam based on the calculated beam position displacement.