Apparatus of plural charged-particle beams
AssigneeASML Netherlands B.V.
InventorsWeiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
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AssigneeASML Netherlands B.V.
InventorsWeiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
Estimating the term…
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
An apparatus for reducing aberrations of beamlets of a multi-beam apparatus, the apparatus comprising:
A method for reducing aberrations of beamlets of a multi-beam apparatus, the method comprising:
Dependencies are inferred from the claim text.