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US 10,896,800 B2Granted
Charged particle beam system and method
AssigneeCarl Zeiss MultiSEM GmbH
InventorsChristoph Riedesel, Dirk Zeidler
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Abstract
A charged particle beam system includes a charged particle source, a multi beam generator, an objective lens, a projection system, and a detector system. The projection system includes a first subcomponent configured to provide low frequency adjustments, and the projection system comprises a second subcomponent configured to provide a high frequency adjustments.
Claims20
A method, comprising:
- a) aligning a multi beam charged particle beam system using static methods and static charged particle optical elements of the multi beam charged particle beam system;
- b) rigging and starting a workflow;
- and
- c) activating a fast multi beam projection alignment system of the multi beam charged particle beam system before a first image is recorded, and
- d) controlling the fast multi beam projection alignment system for an optimal imaging of interaction products onto a plurality of detectors,
- wherein, during a), the fast multi beam projection alignment system is in an off state.
3 more elements
Dependencies are inferred from the claim text.