H01J 2237/1534
Aberrations
H01J2237/1534 (Aberrations) appears on 350 US grants and 408 published applications in this corpus.
Search patents in H01J- Granted patents
- 350
- Published applications
- 408
- Assignees
- 85
- Inventors
- 467
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 4 |
| 2003 | 4 | 7 |
| 2004 | 6 | 4 |
| 2005 | 5 | 7 |
| 2006 | 5 | 9 |
| 2007 | 6 | 16 |
| 2008 | 11 | 19 |
| 2009 | 10 | 20 |
| 2010 | 13 | 11 |
| 2011 | 14 | 13 |
| 2012 | 10 | 13 |
| 2013 | 16 | 11 |
| 2014 | 16 | 11 |
| 2015 | 14 | 11 |
| 2016 | 15 | 19 |
| 2017 | 17 | 16 |
| 2018 | 15 | 10 |
| 2019 | 17 | 23 |
| 2020 | 21 | 19 |
| 2021 | 14 | 23 |
| 2022 | 24 | 32 |
| 2023 | 22 | 30 |
| 2024 | 18 | 33 |
| 2025 | 21 | 29 |
| 2026 | 19 | 18 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Electrostatic mirror chromatic aberration correctors4 Aug 2026US 12,700,563 B2FEI Company
- Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing4 Aug 2026US 12,700,566 B2ASML Netherlands B. V.
- Electron microscope7 Jul 2026US 12,676,279 B2Hitachi High-Tech Corporation
- Method of compensating for an effect of electrode distortion, assessment system30 Jun 2026US 12,671,053 B2ASML Netherlands B. V.
- Correcting for grid distortion8 Oct 2026US 2026/0311956 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Charged particle beam device and method17 Sep 2026US 2026/0279720 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Aberration correction reflector apparatus, aberration correction system, and method thereof17 Sep 2026US 2026/0279721 A1Quantum Science Center of Guangdong-Hongkong-Macao Greater Bay Area
- Aberration corrector, charged particle beam device including same, and control method for controlling same10 Sep 2026US 2026/0269170 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Electron beam exposure apparatus and method, and device manufacturing method80US 5,834,783 ACanon Kabushiki Kaisha · 1998
- Electron beam exposure apparatus and method, and device manufacturing method73US 6,323,499 B1Canon Kabushiki Kaisha · 2001
- Charged-particle beam exposure system and method67US 6,064,807 AFujitsu Limited · 2000
- Objective lens, electron beam system and method of inspecting defect56US 7,420,164 B2Ebara Corporation · 2008
- Apparatus of plural charged-particle beams56US 9,607,805 B2Hermes Microvision, Inc. · 2017