H01J 2237/1532
Astigmatism
H01J2237/1532 (Astigmatism) appears on 175 US grants and 200 published applications in this corpus.
Search patents in H01J- Granted patents
- 175
- Published applications
- 200
- Assignees
- 51
- Inventors
- 349
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 1 | 1 |
| 2005 | 1 | 5 |
| 2006 | 3 | 7 |
| 2007 | 1 | 5 |
| 2008 | 5 | 4 |
| 2009 | 1 | 5 |
| 2010 | 2 | 5 |
| 2011 | 2 | 6 |
| 2012 | 9 | 7 |
| 2013 | 7 | 5 |
| 2014 | 9 | 6 |
| 2015 | 5 | 4 |
| 2016 | 7 | 6 |
| 2017 | 8 | 11 |
| 2018 | 9 | 8 |
| 2019 | 10 | 16 |
| 2020 | 13 | 9 |
| 2021 | 10 | 15 |
| 2022 | 15 | 14 |
| 2023 | 10 | 17 |
| 2024 | 10 | 17 |
| 2025 | 10 | 16 |
| 2026 | 16 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Deflector for a charged particle beam apparatus, deflecting system, charged particle beam apparatus, and method of fabricating a deflector6 Oct 2026US 12,755,923 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Manipulator, manipulator array, charged particle tool, multi-beam charged particle tool, and method of manipulating a charged particle beam4 Aug 2026US 12,700,561 B2ASML Netherlands B. V.
- Electrostatic mirror chromatic aberration correctors4 Aug 2026US 12,700,563 B2FEI Company
- Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing4 Aug 2026US 12,700,566 B2ASML Netherlands B. V.
- Electron-optical plate20 Aug 2026US 2026/0245825 A1ASML Netherlands B. V.
- Rapid mode switching of charged-particle-beam devices13 Aug 2026US 2026/0237595 A1
- Charged particle beam inspection apparatus and method23 Jul 2026US 2026/0213118 A1ASML Netherlands B. V.
- Astigmatism correction method of electron beam imaging device, product and apparatus2 Jul 2026US 2026/0188606 A1Dongfang Jingyuan Electron Limited
- Particle-optical arrangement, for example multi-beam particle microscope, with a magnet arrangement for separating a primary and a secondary particle-optical beam path with improved performance4 Jun 2026US 2026/0155329 A1
Most cited
By later US patents
- Charged-particle beam exposure system and method67US 6,064,807 AFujitsu Limited · 2000
- Apparatus of plural charged-particle beams56US 9,607,805 B2Hermes Microvision, Inc. · 2017
- Focusing system and method for a charged particle imaging system47US 7,696,497 B2Applied Materials Israel Ltd. · 2010
- Apparatus of plural charged-particle beams41US 10,141,160 B2Hermes Microvision, Inc. · 2018
- Charged particle beam system33US 10,811,215 B2Carl Zeiss MultiSEM GmbH · 2020