H01J 2237/1538
Space charge effect compensation
Official title: Space charge (Boersch) effect compensation
H01J2237/1538 (Space charge effect compensation) appears on 28 US grants and 30 published applications in this corpus.
Search patents in H01J- Granted patents
- 28
- Published applications
- 30
- Assignees
- 22
- Inventors
- 63
- Latest grant
- 9 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 1 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 2 |
| 2008 | 2 | 3 |
| 2009 | 0 | 2 |
| 2010 | 4 | 1 |
| 2011 | 4 | 0 |
| 2012 | 0 | 1 |
| 2013 | 2 | 1 |
| 2014 | 0 | 1 |
| 2015 | 0 | 0 |
| 2016 | 0 | 1 |
| 2017 | 0 | 1 |
| 2018 | 1 | 1 |
| 2019 | 1 | 3 |
| 2020 | 0 | 3 |
| 2021 | 2 | 2 |
| 2022 | 4 | 1 |
| 2023 | 3 | 2 |
| 2024 | 1 | 1 |
| 2025 | 2 | 0 |
| 2026 | 0 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- High resolution, multi-electron beam apparatus9 Dec 2025US 12,494,339 B2KLA Corporation
- Multiple charged-particle beam apparatus and methods4 Nov 2025US 12,463,010 B2ASML Netherlands B. V.
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method10 Sep 2024US 12,087,543 B2NuFlare Technology, Inc.
- Multiple charged-particle beam apparatus and methods26 Dec 2023US 11,854,765 B2ASML Netherlands B. V.
- Fill pattern to enhance ebeam process margin14 Feb 2023US 11,581,162 B2Intel Corporation
- Multi-beam particle beam system having an electrostatic booster lens, method for operating a multi-beam particle beam system, and associated computer program product28 May 2026US 2026/0148923 A1
- Reduced boersch effect in dispersive optics15 Jan 2026US 2026/0018365 A1FEI Company
- Multiple charged-particle beam apparatus and methods2 May 2024US 2024/0145214 A1ASML Netherlands B. V.
- High resolution, multi-electron beam apparatus2 Mar 2023US 2023/0066086 A1KLA Corporation
- Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method23 Feb 2023US 2023/0056463 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Charged-particle-beam microlithography apparatus and methods including correction of aberrations caused by space-charge effects39US 6,630,681 B1Nikon Corporation · 2003
- Charged particle beam exposure system6US 6,815,698 B2Kabushiki Kaisha Toshiba · 2004
- Charged particle beam apparatus4US 8,618,480 B2Hermes Microvision, Inc. · 2013
- Methods and devices for examining an electrically charged specimen surface3US 10,068,747 B2Carl Zeiss SMT GmbH · 2018
- Double stage charged particle beam energy width reduction system for charged particle beam system3US 7,679,054 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2010