Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method
AssigneeNuFlare Technology, Inc.
InventorHiroshi Matsumoto
Life of this patent
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Abstract
A multi-charged particle beam writing apparatus according to one aspect of the present invention includes a region setting unit configured to set, as an irradiation region for a beam array to be used, the region of the central portion of an irradiation region for all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, and a writing mechanism, including the multiple beam irradiation mechanism, configured to write a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented.
Claims4
A multi-charged particle beam writing apparatus comprising:
- a shot data generation circuit, provided relating to a first beam array of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, configured to generate shot data for a second beam array whose number of beams is smaller than that of the first beam array implemented;
- a transfer circuit configured to transfer, in order of shot, the shot data for the second beam array whose number of beams is smaller than that of the first beam array implemented;
- a plurality of registers, each arranged for a corresponding beam of the first beam array, each configured to store shot data of the corresponding beam;
- and
- a writing mechanism that includes the multiple beam irradiation mechanism, configured to write a pattern on a target object by performing shots of the second beam array,
- wherein each register of registers, in the plurality of registers, for the second beam array stores shot data for an n-th shot of the second beam array, and simultaneously, each register of registers, in the plurality of registers, for a third beam array, which is other than the second beam array in the first beam array, stores at least a part of shot data for an (n+1)th shot of the second beam array, and in a case of the n-th shot having been completed, the shot data for the (n+1)th shot is shifted at least from the each register for the third beam array to the each register for the second beam array.
A multi-charged particle beam writing method comprising:
- generating, relating to a first beam array of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, shot data for a second beam array whose number of beams is smaller than that of the first beam array implemented to emit charged particle beams by the multiple beam irradiation mechanism;
- transferring, in order of shot, the shot data for the second beam array whose number of beams is smaller than that of the first beam array implemented;
- storing shot data for an n-th shot having been transferred in each register of registers for the second beam array in a plurality of registers each arranged for a corresponding beam of the first beam array, and simultaneously, storing at least a part of shot data for an (n+1)th shot in each register of registers, in the plurality of registers, for a third beam array which is other than the second beam array in the first beam array;
- writing a pattern on a target object by performing the n-th shot of the second beam array;
- and
- shifting, in a case of the n-th shot having been completed, the shot data for the (n+1)th shot at least from the each register for the third beam array to the each register for the second beam array.
Dependencies are inferred from the claim text.