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US 2023/0066086 A1Published application
High resolution, multi-electron beam apparatus
AssigneeKLA Corporation
InventorXinrong Jiang
Life of this patent
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Abstract
For an electron beam system, a Wien filter is in the path of the electron beam between a transfer lens and a stage. The system includes a ground electrode between the Wien filter and the stage, a charge control plate between the ground electrode and the stage, and an acceleration electrode between the ground electrode and the charge control plate. The system can be magnetic or electrostatic.
Claims16
A system comprising:
- a transfer lens disposed in a path of an electron beam downstream of an intermediate image plane;
- a stage disposed in the path of the electron beam, wherein the stage is configured to hold a wafer;
- a Wien filter disposed in the path of the electron beam between the transfer lens and the stage;
- a ground electrode disposed in the path of the electron beam between the Wien filter and the stage;
- a charge control plate disposed in the path of the electron beam between the ground electrode and the stage;
- and
- an acceleration electrode disposed in the path of the electron beam between the ground electrode and the charge control plate.
4 more elements
A method comprising:
- generating an electron beam;
- directing the electron beam through a transfer lens positioned downstream of an intermediate image plane;
- directing the electron beam through a Wien filter positioned downstream of the transfer lens;
- directing the electron beam through a ground electrode positioned downstream of the Wien filter;
- directing the electron beam through an acceleration electrode disposed downstream of the ground electrode;
- directing the electron beam through a charge control plate positioned downstream of the acceleration electrode;
- and
- directing the electron beam at a wafer on a stage positioned downstream of the charge control plate.
5 more elements
Dependencies are inferred from the claim text.