H01J 2237/04
Means for controlling the discharge
H01J2237/04 (Means for controlling the discharge) appears on 1,622 US grants and 1,742 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,622
- Published applications
- 1,742
- Assignees
- 362
- Inventors
- 2,509
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 6 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 5 | 0 |
| 1991 | 3 | 0 |
| 1992 | 7 | 0 |
| 1993 | 7 | 0 |
| 1994 | 11 | 0 |
| 1995 | 14 | 0 |
| 1996 | 11 | 0 |
| 1997 | 10 | 0 |
| 1998 | 16 | 0 |
| 1999 | 28 | 0 |
| 2000 | 19 | 0 |
| 2001 | 23 | 11 |
| 2002 | 24 | 20 |
| 2003 | 29 | 21 |
| 2004 | 16 | 31 |
| 2005 | 23 | 34 |
| 2006 | 38 | 46 |
| 2007 | 32 | 50 |
| 2008 | 35 | 59 |
| 2009 | 49 | 69 |
| 2010 | 56 | 46 |
| 2011 | 40 | 48 |
| 2012 | 46 | 68 |
| 2013 | 65 | 52 |
| 2014 | 67 | 56 |
| 2015 | 73 | 88 |
| 2016 | 78 | 90 |
| 2017 | 66 | 85 |
| 2018 | 86 | 63 |
| 2019 | 88 | 96 |
| 2020 | 90 | 117 |
| 2021 | 89 | 95 |
| 2022 | 79 | 110 |
| 2023 | 90 | 106 |
| 2024 | 57 | 100 |
| 2025 | 77 | 108 |
| 2026 | 59 | 73 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- E-beam exposure method and mask manufacturing method comprising the same6 Oct 2026US 12,755,931 B2Samsung Electronics Co., Ltd.
- Aberration correction systems and charged particle microscope systems including the same29 Sep 2026US 12,749,644 B2FEI Company
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Charged particle beam device and specimen observation method15 Sep 2026US 12,738,442 B2Hitachi High-Tech Corporation
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for continuous chained energy ion implantation1 Oct 2026US 2026/0302126 A1Axcelis Technologies, Inc.
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Blended energy implant17 Sep 2026US 2026/0279718 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Method for implanting negative hydrogen ion and implanting apparatus190US 6,335,535 B12002
- Charged particle beam apparatus and method for operating the same178US 7,045,781 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2006
- Charged particle beam apparatus and method for operating the same159US 7,274,018 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2007
- Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate138US 7,741,620 B2Vistec Electron Beam GmbH · 2010
- Charged particle beam exposure system and charged particle beam exposure method135US 5,260,579 AFujitsu Limited · 1993