H01J 2237/047
Changing particle velocity
H01J2237/047 (Changing particle velocity) appears on 451 US grants and 481 published applications in this corpus.
Search patents in H01J- Granted patents
- 451
- Published applications
- 481
- Assignees
- 162
- Inventors
- 844
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 4 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 7 | 0 |
| 1999 | 7 | 0 |
| 2000 | 8 | 0 |
| 2001 | 7 | 2 |
| 2002 | 13 | 6 |
| 2003 | 15 | 12 |
| 2004 | 2 | 10 |
| 2005 | 9 | 10 |
| 2006 | 13 | 17 |
| 2007 | 6 | 20 |
| 2008 | 10 | 14 |
| 2009 | 22 | 23 |
| 2010 | 19 | 13 |
| 2011 | 9 | 6 |
| 2012 | 10 | 14 |
| 2013 | 18 | 9 |
| 2014 | 10 | 12 |
| 2015 | 18 | 20 |
| 2016 | 15 | 18 |
| 2017 | 14 | 13 |
| 2018 | 16 | 13 |
| 2019 | 20 | 24 |
| 2020 | 21 | 34 |
| 2021 | 31 | 34 |
| 2022 | 20 | 30 |
| 2023 | 29 | 27 |
| 2024 | 18 | 32 |
| 2025 | 19 | 29 |
| 2026 | 17 | 39 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- System and method for plasma processing18 Aug 2026US 12,712,152 B2Tokyo Electron Limited
- Method and apparatus for continuous chained energy ion implantation4 Aug 2026US 12,700,562 B2Axcelis Technologies, Inc.
- Ion milling apparatus16 Jun 2026US 12,658,399 B2Hitachi High-Tech Corporation
- Proximity-electrode, charged particle beam device and method for inspecting and/or imaging a sample16 Jun 2026US 12,658,401 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method and apparatus for continuous chained energy ion implantation1 Oct 2026US 2026/0302126 A1Axcelis Technologies, Inc.
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Blended energy implant17 Sep 2026US 2026/0279718 A1Axcelis Technologies, Inc.
- High Frequency RF Generator and DC Pulsing17 Sep 2026US 2026/0279729 A1Eagle Harbor Technologies, Inc.
- Charged Particle Beam Device3 Sep 2026US 2026/0260845 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Charged particle beam system110US 8,304,725 B2Hitachi High-Technologies Corporation · 2012
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Scanning electron microscope90US 5,872,358 AHitachi, Ltd. · 1999
- Acceleration and analysis architecture for ion implanter80US 6,130,436 AVarian Semiconductor Equipment Associates, Inc. · 2000
- Producing RF electric fields suitable for accelerating atomic and molecular ions in an ion implantation system72US 5,504,341 AZimec Consulting, Inc. · 1996