Blended energy implant

An ion implantation system for sequentially implanting ions into a workpiece, the ion implantation system comprising:

• an ion source configured to generate an ion beam;
• an electrode stage configured to define a final energy of the ion beam during a transport thereof toward the workpiece;
• one or more power sources operably coupled to the electrode stage;
• and
• a controller configured to control the one or more power sources to selectively vary the final energy of the ion beam at the workpiece in a plurality of sequential steps, thereby sequentially implanting the ion beam into the workpiece at a plurality of energies.

A method for implanting ions into a single workpiece with a plurality of sequential implant steps at different predetermined energies using a single tuning recipe, the method comprising:

• configuring one or more ion implantation parameters to implant an ion beam at a first predetermined energy;
• establishing a minimum ion beam angle associated with the first predetermined energy;
• defining a first ion beam orientation angle relative the single workpiece based on the establishing of the minimum ion beam angle associated with the first predetermined energy;
• controlling the one or more ion implantation parameters to implant the ion beam at a second predetermined energy;
• establishing a second minimum ion beam angle associated with the second predetermined energy;
• defining a second ion beam orientation angle relative the single workpiece based on the establishing of the second minimum ion beam angle associated with the second predetermined energy;
• and
• sequentially implanting ion beam into the single workpiece at the first predetermined energy and the second predetermined energy while concurrently respectively controlling the first ion beam orientation angle and the second ion beam orientation angle relative the ion beam.