H01J 2237/043
Beam blanking
H01J2237/043 (Beam blanking) appears on 471 US grants and 515 published applications in this corpus.
Search patents in H01J- Granted patents
- 471
- Published applications
- 515
- Assignees
- 114
- Inventors
- 748
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 4 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 2 |
| 2002 | 3 | 4 |
| 2003 | 3 | 4 |
| 2004 | 2 | 9 |
| 2005 | 8 | 11 |
| 2006 | 16 | 10 |
| 2007 | 11 | 14 |
| 2008 | 7 | 21 |
| 2009 | 17 | 15 |
| 2010 | 12 | 18 |
| 2011 | 8 | 12 |
| 2012 | 14 | 31 |
| 2013 | 23 | 18 |
| 2014 | 27 | 19 |
| 2015 | 27 | 32 |
| 2016 | 30 | 34 |
| 2017 | 22 | 39 |
| 2018 | 38 | 30 |
| 2019 | 37 | 32 |
| 2020 | 35 | 32 |
| 2021 | 24 | 18 |
| 2022 | 19 | 24 |
| 2023 | 20 | 24 |
| 2024 | 11 | 22 |
| 2025 | 14 | 27 |
| 2026 | 12 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Method for estimating cathode lifetime of electron gun, and electron beam writing apparatus28 Jul 2026US 12,695,046 B2NuFlare Technology, Inc.
- Optimizing image distortion in a multi beam charged particle processing apparatus28 Jul 2026US 12,695,055 B2IMS Nanofabrication GmbH
- Non-uniform subsrate processing using a scanned spot ion beam10 Sep 2026US 2026/0269168 A1APPLIED Materials.Inc.
- Multi-charged particle beam irradiation apparatus and alignment method27 Aug 2026US 2026/0253836 A1NuFlare Technology, Inc.
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
- Abnormality diagnosis method for blanking aperture array substrate and multi-beam writing method2 Jul 2026US 2026/0188609 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Method for implanting negative hydrogen ion and implanting apparatus190US 6,335,535 B12002
- Charged particle beam apparatus and method for operating the same178US 7,045,781 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2006
- Charged particle beam apparatus and method for operating the same159US 7,274,018 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2007
- Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate138US 7,741,620 B2Vistec Electron Beam GmbH · 2010
- Charged particle beam exposure system and charged particle beam exposure method135US 5,260,579 AFujitsu Limited · 1993