H01J 2237/0432
High speed and short duration
H01J2237/0432 (High speed and short duration) appears on 80 US grants and 91 published applications in this corpus.
Search patents in H01J- Granted patents
- 80
- Published applications
- 91
- Assignees
- 47
- Inventors
- 206
- Latest grant
- 16 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 1 | 2 |
| 2007 | 3 | 11 |
| 2008 | 2 | 5 |
| 2009 | 9 | 3 |
| 2010 | 1 | 4 |
| 2011 | 2 | 3 |
| 2012 | 2 | 5 |
| 2013 | 6 | 2 |
| 2014 | 5 | 6 |
| 2015 | 6 | 2 |
| 2016 | 6 | 7 |
| 2017 | 5 | 5 |
| 2018 | 4 | 6 |
| 2019 | 8 | 5 |
| 2020 | 4 | 4 |
| 2021 | 5 | 4 |
| 2022 | 3 | 3 |
| 2023 | 2 | 3 |
| 2024 | 2 | 3 |
| 2025 | 2 | 3 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam apparatus and control method for charged particle beam apparatus16 Dec 2025US 12,500,064 B2JEOL Ltd.
- Stroboscopic electron-beam signal image mapping30 Sep 2025US 12,431,327 B2Intel Corporation
- Stroboscopic illumination synchronized electron detection and imaging10 Dec 2024US 12,165,835 B2FEI Company
- Arbitrary electron dose waveforms for electron microscopy3 Sep 2024US 12,080,514 B2Integrated Dynamic Electron Solutions, Inc.
- Stimulated or non-equilibrium energy-loss and energy-gain spectroscopy device28 Nov 2023US 11,830,718 B2Centre National De La Recherche Scientifique
- Charged particle beam writing apparatus18 Jun 2026US 2026/0171352 A1NuFlare Technology, Inc.
- Control System For Ultrafast Electron Beam Microscope4 Jun 2026US 2026/0155328 A1Board of Trustees of Michigan State University
- Ultra fast pulser for low energy electron beams21 May 2026US 2026/0142118 A1Euclid Techlabs, LLC
- Beam alignment and synchronization in microscopy13 Nov 2025US 2025/0349491 A1
- Beam synchronization in microscopy13 Nov 2025US 2025/0349492 A1FEI Company
Most cited
By later US patents
- Lithography system73US 6,958,804 B2Mapper Lithography IP B.V. · 2005
- Apparatus and method for controlled particle beam manufacturing33US 7,259,373 B2NexGenSemi Holdings Corporation · 2007
- Method and system for ultrafast photoelectron microscope25US 7,154,091 B2California Institute of Technology · 2006
- Electron microscope23US 9,024,256 B2Board of Trustees of Michigan State University · 2015
- Apparatus and method for controlled particle beam manufacturing22US 7,659,526 B2NexGen Semi Holding, Inc. · 2010