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US 2026/0171352 A1Published application
Charged particle beam writing apparatus
AssigneeNuFlare Technology, Inc.
InventorYoshiyuki NEGISHI
Life of this patent
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Abstract
In one embodiment, a charged particle beam writing apparatus includes a charged particle source generating and emitting a beam, a blanker controlling ON/OFF of the beam, a stopping aperture substrate having a first opening through which the beam, when controlled to be ON by the blanker, passes toward a substrate, a scattering section through which the beam transmits while being scattered when deflected by the blanker to be OFF, and an absorbing member that absorbs the beam having transmitted through the scattering section.
Claims7
A charged particle beam writing apparatus comprising:
- a charged particle source generating and emitting a beam;
- a blanker controlling ON/OFF of the beam;
- a stopping aperture substrate having a first opening through which the beam, when controlled to be ON by the blanker, passes toward a substrate;
- a scattering section through which the beam transmits while being scattered when deflected by the blanker to be OFF;
- and
- an absorbing member that absorbs the beam having transmitted through the scattering section.
3 more elements
Dependencies are inferred from the claim text.