Back to results
US 6,958,804 B2Granted
Lithography system
AssigneeMapper Lithography IP B.V.
InventorsJan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeMapper Lithography IP B.V.
InventorsJan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
Estimating the term…
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
A maskless lithography system for transferring a pattern onto the surface of a target, comprising:
A process for transferring a predefined pattern onto a substrate using the maskless lithography system comprising:
A method for transferring a pattern onto the surface of a target using a lithography system comprising at least one beam generator for generating a plurality of beamlets and modulation means for individually controllably modulating substantially each beamlet, said method comprising:
Dependencies are inferred from the claim text.