H01J 2237/0435
Multi-aperture
H01J2237/0435 (Multi-aperture) appears on 332 US grants and 377 published applications in this corpus.
Search patents in H01J- Granted patents
- 332
- Published applications
- 377
- Assignees
- 59
- Inventors
- 457
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 4 |
| 2003 | 2 | 3 |
| 2004 | 1 | 7 |
| 2005 | 7 | 9 |
| 2006 | 13 | 4 |
| 2007 | 7 | 4 |
| 2008 | 1 | 14 |
| 2009 | 7 | 10 |
| 2010 | 7 | 11 |
| 2011 | 4 | 6 |
| 2012 | 12 | 24 |
| 2013 | 15 | 10 |
| 2014 | 17 | 12 |
| 2015 | 15 | 24 |
| 2016 | 19 | 22 |
| 2017 | 16 | 36 |
| 2018 | 32 | 23 |
| 2019 | 30 | 25 |
| 2020 | 26 | 24 |
| 2021 | 18 | 15 |
| 2022 | 15 | 19 |
| 2023 | 16 | 18 |
| 2024 | 9 | 18 |
| 2025 | 10 | 24 |
| 2026 | 12 | 10 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Method for estimating cathode lifetime of electron gun, and electron beam writing apparatus28 Jul 2026US 12,695,046 B2NuFlare Technology, Inc.
- Optimizing image distortion in a multi beam charged particle processing apparatus28 Jul 2026US 12,695,055 B2IMS Nanofabrication GmbH
- Multi-charged particle beam irradiation apparatus and alignment method27 Aug 2026US 2026/0253836 A1NuFlare Technology, Inc.
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
- Abnormality diagnosis method for blanking aperture array substrate and multi-beam writing method2 Jul 2026US 2026/0188609 A1NuFlare Technology, Inc.
- Charged particle beam writing apparatus18 Jun 2026US 2026/0171352 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Charged particle beam apparatus and method for operating the same178US 7,045,781 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2006
- Charged particle beam apparatus and method for operating the same159US 7,274,018 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2007
- Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate138US 7,741,620 B2Vistec Electron Beam GmbH · 2010
- Charged particle beam exposure system and charged particle beam exposure method135US 5,260,579 AFujitsu Limited · 1993
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007