H01J 2237/0437
Semiconductor substrate
H01J2237/0437 (Semiconductor substrate) appears on 108 US grants and 132 published applications in this corpus.
Search patents in H01J- Granted patents
- 108
- Published applications
- 132
- Assignees
- 35
- Inventors
- 191
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 1 |
| 2003 | 0 | 0 |
| 2004 | 0 | 2 |
| 2005 | 3 | 2 |
| 2006 | 1 | 1 |
| 2007 | 2 | 1 |
| 2008 | 0 | 7 |
| 2009 | 1 | 1 |
| 2010 | 4 | 7 |
| 2011 | 0 | 4 |
| 2012 | 7 | 14 |
| 2013 | 10 | 2 |
| 2014 | 7 | 4 |
| 2015 | 5 | 8 |
| 2016 | 8 | 7 |
| 2017 | 4 | 9 |
| 2018 | 7 | 4 |
| 2019 | 4 | 5 |
| 2020 | 9 | 11 |
| 2021 | 10 | 10 |
| 2022 | 4 | 4 |
| 2023 | 6 | 9 |
| 2024 | 2 | 8 |
| 2025 | 4 | 6 |
| 2026 | 8 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Mounting substrate, blanking aperture array chip, blanking aperture array system and multi charged particle beam irradiation apparatus26 May 2026US 12,640,331 B2NuFlare Technology, Inc.
- Blanking aperture array system and multi charged particle beam writing apparatus5 May 2026US 12,620,545 B2NuFlare Technology, Inc.
- Beam manipulator in charged particle-beam exposure apparatus5 May 2026US 12,620,547 B2ASML Netherlands B. V.
- Multi-beam pattern definition device28 Apr 2026US 12,614,695 B2IMS Nanofabrication GmbH
- Multi-charged particle beam irradiation apparatus and alignment method27 Aug 2026US 2026/0253836 A1NuFlare Technology, Inc.
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
- Electron-optical element4 Jun 2026US 2026/0155274 A1ASML Netherlands B. V.
- Electronic component19 Mar 2026US 2026/0081096 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method11 Dec 2025US 2025/0379029 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate138US 7,741,620 B2Vistec Electron Beam GmbH · 2010
- Lithography system73US 6,958,804 B2Mapper Lithography IP B.V. · 2005
- Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus45US 6,903,353 B2Advantest Corporation · 2005
- Pattern definition device with multiple multibeam array43US 8,546,767 B2IMS Nanofabrication GmbH · 2013
- Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector41US 7,109,494 B2Canon Kabushiki Kaisha · 2006