Multi-beam pattern definition device

A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, said device being adapted to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming a corresponding number of beamlets, said device comprising:

• an aperture array device in which said apertures are realized, wherein the aperture array device comprises at least two sets of apertures, each set of apertures comprising a plurality of apertures arranged in a substantially regular arrangement on the aperture array device with the arrangements of said sets being interlacing at least partially, wherein the apertures of different sets are, at least in a region where the arrangements are interlacing, offset to each other by displacements which correspond to a common displacement vector,
• an opening array device located downstream of the aperture array device and having a plurality of openings configured for the passage of beamlets that are formed by at least a subset of said apertures,
• said opening array device comprises impact regions, said impact regions being located at locations corresponding to apertures of at least one of said set of apertures in at least a region corresponding to said region of interlacing of arrangements, wherein charged particles which passed through apertures of the at least one of said set of apertures corresponding to impact regions impinge upon said impact regions, wherein said plurality of openings in the opening array device are arranged in a substantially regular arrangement corresponding to the arrangement of at least one other of said sets of apertures of the aperture array device in said region,
• wherein said aperture array device comprises a plurality of additional apertures, which are located outside the region of interlacing arrangements of the at least two sets of apertures, said additional apertures are configured for the passage of charged particles to form additional beamlets,
• wherein said opening array device comprises additional impact regions, said additional impact regions being located at locations corresponding to the additional apertures of the aperture array device such that charged particles which pass through additional apertures impinge upon additional impact regions.