Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus

A device manufacturing method including the steps of:

• applying a photosensitive material on a substrate;
• exposing a pattern on the substrate coated with the photosensitive material with a charged particle beam exposure apparatus, and
• developing the photosensitive material on the substrate exposed to the pattern,
• the charged particle beam exposure apparatus comprising
• (i) a charged particle beam source,
• (ii) an electron optical element for forming a plurality of intermediate images of the charged particle source within or in the vicinity of a plane,
• (iii) a blanker array having a plurality of blankers arranged on the plane for individually controlling whether to shield each of the plurality of charged particle beams,
• (iv) a reduction electron optical system for reducing and projecting the intermediate images onto a substrate, and
• (v) a correction lens array having a plurality of electron lenses, arranged between said blanker array and said reduction electron optical system, for respectively adjusting each virtual image position of the plurality of intermediate images in accordance with an aberration of said reduction electron optical system.

A charged particle beam applied apparatus comprising:

• a charged particle beam source,
• an electron optical element for forming a plurality of intermediate images of said charged particle beam source within or in the vicinity of a plane,
• a blanker array having a plurality of blankers arranged on the plane for individually controlling whether to shield each of the plurality of charged particle beams,
• a reduction electron optical system for reducing and projecting the plurality of intermediate images onto a substrate, and
• a correction lens array having a plurality of electron lenses, arranged between said blanker array and said reduction electron optical system, for respectively adjusting each virtual image position of the plurality of intermediate images in accordance with an aberration of said reduction electron optical system.

A charged particle beam exposure apparatus for exposing a pattern on a substrate by using a plurality of charged particle beams, said apparatus comprising:

• an electron optical element for focusing each of the plurality of charged particle beams within or in the vicinity of a plane;
• a blanker array having a plurality of blankers arranged on the plane, for individually controlling whether to shield each of the plurality of charged particle beams;
• an electron optical system for projecting the plurality of charged particle beams from said blanker array onto a substrate;
• and
• a correction lens array having a plurality of electron lenses, arranged between said blanker array and said reduction electron optical system, for respectively adjusting each virtual image position of the plurality of intermediate images in accordance with an aberration of said reduction electron optical system.