Beam manipulator in charged particle-beam exposure apparatus
AssigneeASML Netherlands B.V.
InventorsJohannes Cornelis Jacobus De Langen, Dmitry Mudretsov, Dongbin Cai
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Abstract
An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.
Claims19
An electron beam manipulator for manipulating an electron beam in an electron projection system, the electron beam manipulator comprising:
- a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and defining an aperture through the body, the body comprising a plurality of electrodes associated with the aperture, the electrodes forming at least part of the interconnecting surface between the first surface and the second surface and at least part of the first surface so that at least part of each of the electrodes is positioned on the first surface,
- wherein two adjacent facing surfaces of adjacent electrodes of the plurality of electrodes define a gap having a radial length longer than a radial length of at least one electrode.
A method for manufacturing an electron beam manipulator, the method comprising:
- providing a workpiece comprising a substrate having a first surface and a second surface and an electrode layer formed relative to the first surface, the electrode layer having an electrode portion;
- forming a resist mask having an opening corresponding to a pattern on the workpiece, leaving an unmasked portion of the substrate;
- etching the unmasked portion of the substrate such that an inner wall is formed through the substrate to extend between the first surface and the second surface;
- removing the resist mask;
- and
- forming a first conductive layer coating the inner wall of the substrate interconnecting the first and second surfaces,
- wherein the electrode layer is etched such that the electrode portion includes multiple electrode portions,
- wherein the electrode portions comprising at least part of an interconnecting surface between the first surface and the second surface and at least part of the electrode layer so that at least part of each of the electrode portions is positioned on the first surface, adjacent electrode portions of the multiple electrode portions being separated via a gap formed by the etching,
- wherein the gap has a radial length longer than a radial length of at least one electrode portion.
An electron beam manipulator configured to manipulate an electron beam in a projection system of an electron beam tool, the electron beam manipulator comprising:
- a substrate having opposing major surfaces and a through passage providing an interconnecting surface extending between the major surfaces, at least part of the interconnecting surface being formed by a plurality of electrodes configured in use to be held at a potential difference, at least part of each electrode being positioned on one of the major surfaces and two adjacent facing surfaces of adjacent electrodes of the electrodes defining a gap, and the through passage comprises a shield that is configured to shield the at least part of at least one electrode,
- wherein the gap has a radial length longer than a radial length of at least one electrode.
Dependencies are inferred from the claim text.