H01J 2237/25
Tubes for localised analysis using electron or ion beams
H01J2237/25 (Tubes for localised analysis using electron or ion beams) appears on 347 US grants and 279 published applications in this corpus.
Search patents in H01J- Granted patents
- 347
- Published applications
- 279
- Assignees
- 170
- Inventors
- 728
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 8 | 0 |
| 1993 | 5 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 11 | 0 |
| 1997 | 8 | 0 |
| 1998 | 8 | 0 |
| 1999 | 7 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 2 |
| 2002 | 10 | 6 |
| 2003 | 17 | 8 |
| 2004 | 15 | 13 |
| 2005 | 9 | 23 |
| 2006 | 13 | 17 |
| 2007 | 13 | 31 |
| 2008 | 17 | 18 |
| 2009 | 28 | 19 |
| 2010 | 20 | 12 |
| 2011 | 11 | 6 |
| 2012 | 12 | 8 |
| 2013 | 9 | 7 |
| 2014 | 11 | 7 |
| 2015 | 5 | 13 |
| 2016 | 10 | 8 |
| 2017 | 8 | 4 |
| 2018 | 2 | 1 |
| 2019 | 5 | 6 |
| 2020 | 6 | 17 |
| 2021 | 13 | 15 |
| 2022 | 13 | 12 |
| 2023 | 9 | 8 |
| 2024 | 5 | 8 |
| 2025 | 6 | 5 |
| 2026 | 6 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Automated application of drift correction to sample studied under electron microscope15 Sep 2026US 12,739,513 B2Protochips, Inc.
- Information processing system and phase analysis system7 Jul 2026US 12,676,287 B2Hitachi, Ltd.
- Joint nanoscale three-dimensional imaging and chemical analysis14 Apr 2026US 12,601,698 B2Luxembourg Institute of Science and Technology (List)
- Charged particle beam apparatus7 Apr 2026US 12,597,582 B2JEOL Ltd.
- Hybrid apparatus, system and techniques for mass analyzed ion beam10 Mar 2026US 12,573,579 B2APPLIED Materials.Inc.
- Analyzer and Analysis Method27 Aug 2026US 2026/0251596 A1JEOL Ltd.
- Preventing esd in prt sem discharges7 May 2026US 2026/0128251 A1
- Measurement device26 Mar 2026US 2026/0085932 A1Yokogawa Electric Corporation
- Techniques for electron energy loss spectroscopy at high energy losses with magnetic immersion objective12 Mar 2026US 2026/0071977 A1
- Apparatus and method for improved electron multi-beam inspection12 Feb 2026US 2026/0045438 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Feature-based defect detection256US 6,539,106 B1APPLIED Materials.Inc. · 2003
- Voltage contrast method for semiconductor inspection using low voltage particle beam157US 6,344,750 B12002
- Method of probing a net of an IC at an optimal probe-point121US 5,530,372 ASchlumberger Technologies, Inc. · 1996
- Optimal probe point placement113US 5,675,499 ASchlumberger Technologies, Inc. · 1997
- Hermetic sample holder and method for performing microanalysis under controlled atmosphere environment102US 8,087,309 B2Sion Power Corporation · 2012