Techniques for electron energy loss spectroscopy at high energy losses with magnetic immersion objective

One or more machine readable storage media, storing instructions that, when executed by a machine, cause the machine to perform operations comprising:

• modifying an accelerating voltage of a source of a charged particle beam system from a first energy to a second energy, the first energy and the second energy separated by an energy difference;
• modifying one or more optical elements of the charged particle beam system, in accordance with a calibration for the second energy;
• generating a set of operating conditions for a projection optics system of the charged particle beam system, the set of operating conditions being based at least in part on operating the source at about the second energy;
• modifying one or more elements of the projection optics system in at least partial accordance with the set of operating conditions;
• modifying a condenser lens of the charged particle beam system in accordance with focusing a beam of charged particles onto a sample position, the beam of charged particles having an energy about the second energy;
• and
• modifying the accelerating voltage from the second energy to the first energy.

A charged particle beam system, comprising:

• a charged particle source;
• a charged particle optical column coupled with the source, comprising:
• an objective section, defining a sample position;
• and
• a projection optics system;
• a detector section, coupled with the column;
• control circuitry, operably coupled with the source, the column, and the detector section;
• and
• one or more machine readable storage media, operably coupled with the control circuitry, storing instructions that, when executed by a machine, cause the machine to perform one or more operations comprising:
• modifying an accelerating voltage of a source of the charged particle beam system from a first energy to a second energy, the first energy and the second energy separated by an energy difference;
• modifying an optical element of the charged particle beam system, such that the optical element is calibrated for the second energy;
• generating a set of operating conditions for the projection optics system, the set of operating conditions being based at least in part on operating the charged particle source at about the second energy;
• modifying one or more elements of the projection optics system in at least partial accordance with the set of operating conditions;
• modifying a condenser lens of the charged particle beam system in accordance with focusing a beam of charged particles onto the sample position, the beam of charged particles having an energy about the second energy;
• and
• modifying the accelerating voltage from the second energy to the first energy.